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Transport and spin relaxation characteristics of the conduction electrons in silicon samples doped with bismuth in the 1.1·1013 - 7.7·1015 cm-3 concentration range were studied by the Hall and electron spin resonance spectroscopy. Hall effect measurements in the temperature range 10-80 K showed a deviation from the linear dependence of the Hall resistance in the magnetic field, which is a manifestation of the anomalous Hall effect. The magnetoresistance investigation shows that with current increasing magnetoresistance may change its sign from positive to negative, which is most clearly seen when the bismuth concentration goes up to 7.7·1015 cm-3. The conduction electron spin relaxation rate dramatically increases in silicon samples with sufficiently low concentration of bismuth ~ 2·1014 cm-3. All these results can be explained in terms of the concept of spin-dependent and spin flip scattering induced by heavy bismuth impurity centers.
Язык оригинала | английский |
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Название основной публикации | Gettering and Defect Engineering in Semiconductor Technology XVI |
Редакторы | Peter Pichler, Peter Pichler |
Издатель | Trans Tech Publications Ltd |
Страницы | 327-331 |
Число страниц | 5 |
ISBN (печатное издание) | 9783038356080 |
DOI | |
Состояние | Опубликовано - 1 янв 2016 |
Событие | 16th International Conference on Gettering and Defect Engineering in Semiconductor Technology, GADEST 2015 - Bad Staffelstein, Германия Продолжительность: 20 сен 2015 → 25 сен 2015 |
Название | Solid State Phenomena |
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Том | 242 |
ISSN (электронное издание) | 1662-9779 |
конференция | 16th International Conference on Gettering and Defect Engineering in Semiconductor Technology, GADEST 2015 |
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Страна/Tерритория | Германия |
Город | Bad Staffelstein |
Период | 20/09/15 → 25/09/15 |
ID: 47708992