Результаты исследований: Научные публикации в периодических изданиях › статья в журнале по материалам конференции › Рецензирование
Si(Li) detector with ultra-thin entrance window on the diffusive lithium side. / Bazlov, N. V.; Derbin, A. V.; Drachnev, I. S.; Gicharevich, G. E.; Kotina, I. M.; Konkov, O. I.; Pilipenko, N. V.; Chmel, E. A.; Abolmasov, S. N.; Terukov, E. I.; Unzhakov, E. V.
в: Journal of Physics: Conference Series, Том 1400, № 5, 055056, 11.12.2019.Результаты исследований: Научные публикации в периодических изданиях › статья в журнале по материалам конференции › Рецензирование
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TY - JOUR
T1 - Si(Li) detector with ultra-thin entrance window on the diffusive lithium side
AU - Bazlov, N. V.
AU - Derbin, A. V.
AU - Drachnev, I. S.
AU - Gicharevich, G. E.
AU - Kotina, I. M.
AU - Konkov, O. I.
AU - Pilipenko, N. V.
AU - Chmel, E. A.
AU - Abolmasov, S. N.
AU - Terukov, E. I.
AU - Unzhakov, E. V.
N1 - Funding Information: This work was supported by the Russian Fund for Basic Research grants # 19-02-00097, # 17-02-00305 and # 16-29-13014 and, partially, by Russian Science Foundation grant # 17-12-01009. Publisher Copyright: © Published under licence by IOP Publishing Ltd. Copyright: Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2019/12/11
Y1 - 2019/12/11
N2 - Present work reports the results of activities intended to reach thin Si(Li) detector entrance window on the diffusive lithium layer side. It was established that the new n-contact represented by a heterostructure of unalloyed amorphous n-type silicon a-Si:H allows one to achieve the entrance window thickness 3-4 orders of magnitude smaller than the lithium-side entrance window of standard Si(Li) detectors. The films of amorphous silicon were synthesized with MASD (magnetron assisted silane decomposition) method in mixture of SiH4 (25%) and Ar (75%) gases. Lithium layer surface resistivity and silicon target type (n-or p-) affection on electrical properties of Si(Li) detector contact produced were studied. The investigation performed had led to a technology of Si(Li) detector production with thickness of the entrance window on the diffusive lithium layer side below 0.1 μm.
AB - Present work reports the results of activities intended to reach thin Si(Li) detector entrance window on the diffusive lithium layer side. It was established that the new n-contact represented by a heterostructure of unalloyed amorphous n-type silicon a-Si:H allows one to achieve the entrance window thickness 3-4 orders of magnitude smaller than the lithium-side entrance window of standard Si(Li) detectors. The films of amorphous silicon were synthesized with MASD (magnetron assisted silane decomposition) method in mixture of SiH4 (25%) and Ar (75%) gases. Lithium layer surface resistivity and silicon target type (n-or p-) affection on electrical properties of Si(Li) detector contact produced were studied. The investigation performed had led to a technology of Si(Li) detector production with thickness of the entrance window on the diffusive lithium layer side below 0.1 μm.
UR - http://www.scopus.com/inward/record.url?scp=85077542284&partnerID=8YFLogxK
U2 - 10.1088/1742-6596/1400/5/055056
DO - 10.1088/1742-6596/1400/5/055056
M3 - Conference article
AN - SCOPUS:85077542284
VL - 1400
JO - Journal of Physics: Conference Series
JF - Journal of Physics: Conference Series
SN - 1742-6588
IS - 5
M1 - 055056
T2 - International Conference PhysicA.SPb 2019
Y2 - 22 October 2019 through 24 October 2019
ER -
ID: 75066856