Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
It is demonstrated that detachment of electrons in the afterglow of an electronegative plasma can lead to a significant increase in negative wall potential with respect to the plasma potential. This effect can be used to modify the near-wall sheath electric field and thickness, which are important for plasma processing applications. Also in the afterglow, this effect can lead to an increase in electron density with time, and a reduction (up to total exclusion) in diffusion cooling of electrons and can thus be used to modify the electron temperature.
Язык оригинала | английский |
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Номер статьи | 021501 |
Журнал | Applied Physics Letters |
Том | 89 |
Номер выпуска | 2 |
DOI | |
Состояние | Опубликовано - 2006 |
ID: 5040890