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Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage. / Bogdanov, E. A.; DeJoseph, C. A.; Demidov, V. I.; Kudryavtsev, A. A.

в: Applied Physics Letters, Том 89, № 2, 021501, 2006.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

Harvard

Bogdanov, EA, DeJoseph, CA, Demidov, VI & Kudryavtsev, AA 2006, 'Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage', Applied Physics Letters, Том. 89, № 2, 021501. https://doi.org/10.1063/1.2220005, https://doi.org/doi:10.1063/1.2220005

APA

Bogdanov, E. A., DeJoseph, C. A., Demidov, V. I., & Kudryavtsev, A. A. (2006). Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage. Applied Physics Letters, 89(2), [021501]. https://doi.org/10.1063/1.2220005, https://doi.org/doi:10.1063/1.2220005

Vancouver

Bogdanov EA, DeJoseph CA, Demidov VI, Kudryavtsev AA. Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage. Applied Physics Letters. 2006;89(2). 021501. https://doi.org/10.1063/1.2220005, https://doi.org/doi:10.1063/1.2220005

Author

Bogdanov, E. A. ; DeJoseph, C. A. ; Demidov, V. I. ; Kudryavtsev, A. A. / Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage. в: Applied Physics Letters. 2006 ; Том 89, № 2.

BibTeX

@article{4fedaf6bcd3c432aaa90b223f80443cd,
title = "Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage",
abstract = "It is demonstrated that detachment of electrons in the afterglow of an electronegative plasma can lead to a significant increase in negative wall potential with respect to the plasma potential. This effect can be used to modify the near-wall sheath electric field and thickness, which are important for plasma processing applications. Also in the afterglow, this effect can lead to an increase in electron density with time, and a reduction (up to total exclusion) in diffusion cooling of electrons and can thus be used to modify the electron temperature.",
keywords = "electron detachment, plasma-wall interactions, afterglows, plasma sheaths, plasma density, plasma transport processes, plasma temperature",
author = "Bogdanov, {E. A.} and DeJoseph, {C. A.} and Demidov, {V. I.} and Kudryavtsev, {A. A.}",
note = "Copyright: Copyright 2011 Elsevier B.V., All rights reserved.",
year = "2006",
doi = "10.1063/1.2220005",
language = "English",
volume = "89",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics",
number = "2",

}

RIS

TY - JOUR

T1 - Effect of electron detachment on the wall potential and plasma evolution in the afterglow stage

AU - Bogdanov, E. A.

AU - DeJoseph, C. A.

AU - Demidov, V. I.

AU - Kudryavtsev, A. A.

N1 - Copyright: Copyright 2011 Elsevier B.V., All rights reserved.

PY - 2006

Y1 - 2006

N2 - It is demonstrated that detachment of electrons in the afterglow of an electronegative plasma can lead to a significant increase in negative wall potential with respect to the plasma potential. This effect can be used to modify the near-wall sheath electric field and thickness, which are important for plasma processing applications. Also in the afterglow, this effect can lead to an increase in electron density with time, and a reduction (up to total exclusion) in diffusion cooling of electrons and can thus be used to modify the electron temperature.

AB - It is demonstrated that detachment of electrons in the afterglow of an electronegative plasma can lead to a significant increase in negative wall potential with respect to the plasma potential. This effect can be used to modify the near-wall sheath electric field and thickness, which are important for plasma processing applications. Also in the afterglow, this effect can lead to an increase in electron density with time, and a reduction (up to total exclusion) in diffusion cooling of electrons and can thus be used to modify the electron temperature.

KW - electron detachment

KW - plasma-wall interactions

KW - afterglows

KW - plasma sheaths

KW - plasma density

KW - plasma transport processes

KW - plasma temperature

UR - http://www.scopus.com/inward/record.url?scp=33746062428&partnerID=8YFLogxK

U2 - 10.1063/1.2220005

DO - 10.1063/1.2220005

M3 - Article

VL - 89

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 2

M1 - 021501

ER -

ID: 5040890