Standard

Effect of deposition technique on chemical bonding and amount of porogen residuals in organosilicate glasses: NEXAFS study. / Konashuk, A. ; Filatova, E. ; Sakhonenkov, S. ; Afanas'ev, V. V.

в: Microelectronic Engineering, № Special Issue, 2017.

Результаты исследований: Научные публикации в периодических изданиях › тезисы › Рецензирование

Harvard

Konashuk, A, Filatova, E, Sakhonenkov, S & Afanas'ev, VV 2017, 'Effect of deposition technique on chemical bonding and amount of porogen residuals in organosilicate glasses: NEXAFS study', Microelectronic Engineering, № Special Issue.

APA

Konashuk, A., Filatova, E., Sakhonenkov, S., & Afanas'ev, V. V. (2017). Effect of deposition technique on chemical bonding and amount of porogen residuals in organosilicate glasses: NEXAFS study. Microelectronic Engineering, (Special Issue).

Vancouver

Konashuk A, Filatova E, Sakhonenkov S, Afanas'ev VV. Effect of deposition technique on chemical bonding and amount of porogen residuals in organosilicate glasses: NEXAFS study. Microelectronic Engineering. 2017;(Special Issue).

Author

Konashuk, A. ; Filatova, E. ; Sakhonenkov, S. ; Afanas'ev, V. V. / Effect of deposition technique on chemical bonding and amount of porogen residuals in organosilicate glasses: NEXAFS study. в: Microelectronic Engineering. 2017 ; № Special Issue.

BibTeX

@article{669a2ff75d30418f8f82e38389fd23af,
title = "Effect of deposition technique on chemical bonding and amount of porogen residuals in organosilicate glasses: NEXAFS study",
author = "A. Konashuk and E. Filatova and S. Sakhonenkov and Afanas'ev, {V. V.}",
year = "2017",
language = "English",
journal = "Microelectronic Engineering",
issn = "0167-9317",
publisher = "Elsevier",
number = "Special Issue",
note = " 20th Conference on Insulating Films on Semiconductors, INFOS2017 ; Conference date: 27-06-2017 Through 30-06-2017",

}

RIS

TY - JOUR

T1 - Effect of deposition technique on chemical bonding and amount of porogen residuals in organosilicate glasses: NEXAFS study

AU - Konashuk, A.

AU - Filatova, E.

AU - Sakhonenkov, S.

AU - Afanas'ev, V. V.

PY - 2017

Y1 - 2017

UR - https://www.researchgate.net/publication/316969012_Effect_of_deposition_technique_on_chemical_bonding_and_amount_of_porogen_residues_in_organosilicate_glass

M3 - Meeting Abstract

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

IS - Special Issue

T2 - 20th Conference on Insulating Films on Semiconductors

Y2 - 27 June 2017 through 30 June 2017

ER -

ID: 94122924