Research output: Contribution to journal › Article › peer-review
Technology of the Atomic Layer Deposition for modification Microchannel Plates with High Aspect Ratio. / Drozd, A.V.; Yafyasov, A.M.; Baraban, A.P.; Nikiforova , I.O.
In: Nanobiotechnology Reports, Vol. 18, No. Suppl 1, 12.2023, p. S179–S185.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Technology of the Atomic Layer Deposition for modification Microchannel Plates with High Aspect Ratio.
AU - Drozd, A.V.
AU - Yafyasov, A.M.
AU - Baraban, A.P.
AU - Nikiforova , I.O.
PY - 2023/12
Y1 - 2023/12
U2 - 10.1134/S2635167623600682
DO - 10.1134/S2635167623600682
M3 - Article
VL - 18
SP - S179–S185
JO - Nanobiotechnology Reports
JF - Nanobiotechnology Reports
SN - 2635-1676
IS - Suppl 1
ER -
ID: 118281207