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Technology of the Atomic Layer Deposition for modification Microchannel Plates with High Aspect Ratio. / Drozd, A.V.; Yafyasov, A.M.; Baraban, A.P.; Nikiforova , I.O.

в: Nanobiotechnology Reports, Том 18, № Suppl 1, 12.2023, стр. S179–S185.

Результаты исследований: Научные публикации в периодических изданияхстатьяРецензирование

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Author

Drozd, A.V. ; Yafyasov, A.M. ; Baraban, A.P. ; Nikiforova , I.O. / Technology of the Atomic Layer Deposition for modification Microchannel Plates with High Aspect Ratio. в: Nanobiotechnology Reports. 2023 ; Том 18, № Suppl 1. стр. S179–S185.

BibTeX

@article{bc6af7fb38f34cc9919570b844198df6,
title = "Technology of the Atomic Layer Deposition for modification Microchannel Plates with High Aspect Ratio.",
author = "A.V. Drozd and A.M. Yafyasov and A.P. Baraban and I.O. Nikiforova",
year = "2023",
month = dec,
doi = "10.1134/S2635167623600682",
language = "English",
volume = "18",
pages = "S179–S185",
journal = "Nanobiotechnology Reports",
issn = "2635-1676",
publisher = "Pleiades Publishing",
number = "Suppl 1",

}

RIS

TY - JOUR

T1 - Technology of the Atomic Layer Deposition for modification Microchannel Plates with High Aspect Ratio.

AU - Drozd, A.V.

AU - Yafyasov, A.M.

AU - Baraban, A.P.

AU - Nikiforova , I.O.

PY - 2023/12

Y1 - 2023/12

U2 - 10.1134/S2635167623600682

DO - 10.1134/S2635167623600682

M3 - Article

VL - 18

SP - S179–S185

JO - Nanobiotechnology Reports

JF - Nanobiotechnology Reports

SN - 2635-1676

IS - Suppl 1

ER -

ID: 118281207