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Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks. / Filatova, E.O.; Kozhevnikov, I.V.; Sokolov, A.A.; Ubyivovk, E.V.; S. Yulin, [Unknown]; Gorgoi, M.; Schaefers, F.

In: Science and Technology of Advanced Materials, Vol. 13, No. 1, 2012, p. 015001_1-12.

Research output: Contribution to journal › Article

Harvard

Filatova, EO, Kozhevnikov, IV, Sokolov, AA, Ubyivovk, EV, S. Yulin, U, Gorgoi, M & Schaefers, F 2012, 'Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks', Science and Technology of Advanced Materials, vol. 13, no. 1, pp. 015001_1-12. https://doi.org/doi:10.1088/1468-6996/13/1/015001

APA

Filatova, E. O., Kozhevnikov, I. V., Sokolov, A. A., Ubyivovk, E. V., S. Yulin, U., Gorgoi, M., & Schaefers, F. (2012). Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks. Science and Technology of Advanced Materials, 13(1), 015001_1-12. https://doi.org/doi:10.1088/1468-6996/13/1/015001

Vancouver

Filatova EO, Kozhevnikov IV, Sokolov AA, Ubyivovk EV, S. Yulin U, Gorgoi M et al. Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks. Science and Technology of Advanced Materials. 2012;13(1):015001_1-12. https://doi.org/doi:10.1088/1468-6996/13/1/015001

Author

Filatova, E.O. ; Kozhevnikov, I.V. ; Sokolov, A.A. ; Ubyivovk, E.V. ; S. Yulin, [Unknown] ; Gorgoi, M. ; Schaefers, F. / Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks. In: Science and Technology of Advanced Materials. 2012 ; Vol. 13, No. 1. pp. 015001_1-12.

BibTeX

@article{42acdbf0cfa84784a91daec53020a658,
title = "Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks",
author = "E.O. Filatova and I.V. Kozhevnikov and A.A. Sokolov and E.V. Ubyivovk and {S. Yulin}, [Unknown] and M. Gorgoi and F. Schaefers",
year = "2012",
doi = "doi:10.1088/1468-6996/13/1/015001",
language = "English",
volume = "13",
pages = "015001_1--12",
journal = "Science and Technology of Advanced Materials",
issn = "1468-6996",
publisher = "Taylor & Francis",
number = "1",

}

RIS

TY - JOUR

T1 - Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks

AU - Filatova, E.O.

AU - Kozhevnikov, I.V.

AU - Sokolov, A.A.

AU - Ubyivovk, E.V.

AU - S. Yulin, [Unknown]

AU - Gorgoi, M.

AU - Schaefers, F.

PY - 2012

Y1 - 2012

U2 - doi:10.1088/1468-6996/13/1/015001

DO - doi:10.1088/1468-6996/13/1/015001

M3 - Article

VL - 13

SP - 015001_1-12

JO - Science and Technology of Advanced Materials

JF - Science and Technology of Advanced Materials

SN - 1468-6996

IS - 1

ER -

ID: 5193817