Standard
Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks. / Filatova, E.O.; Kozhevnikov, I.V.; Sokolov, A.A.; Ubyivovk, E.V.; S. Yulin, [Unknown]; Gorgoi, M.; Schaefers, F.
в:
Science and Technology of Advanced Materials, Том 13, № 1, 2012, стр. 015001_1-12.
Результаты исследований: Научные публикации в периодических изданиях › статья
Harvard
Filatova, EO, Kozhevnikov, IV, Sokolov, AA
, Ubyivovk, EV, S. Yulin, U, Gorgoi, M & Schaefers, F 2012, '
Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks',
Science and Technology of Advanced Materials, Том. 13, № 1, стр. 015001_1-12.
https://doi.org/doi:10.1088/1468-6996/13/1/015001
APA
Filatova, E. O., Kozhevnikov, I. V., Sokolov, A. A.
, Ubyivovk, E. V., S. Yulin, U., Gorgoi, M., & Schaefers, F. (2012).
Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks.
Science and Technology of Advanced Materials,
13(1), 015001_1-12.
https://doi.org/doi:10.1088/1468-6996/13/1/015001
Vancouver
Author
Filatova, E.O. ; Kozhevnikov, I.V. ; Sokolov, A.A.
; Ubyivovk, E.V. ; S. Yulin, [Unknown] ; Gorgoi, M. ; Schaefers, F. /
Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks. в:
Science and Technology of Advanced Materials. 2012 ; Том 13, № 1. стр. 015001_1-12.
BibTeX
@article{42acdbf0cfa84784a91daec53020a658,
title = "Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks",
author = "E.O. Filatova and I.V. Kozhevnikov and A.A. Sokolov and E.V. Ubyivovk and {S. Yulin}, [Unknown] and M. Gorgoi and F. Schaefers",
year = "2012",
doi = "doi:10.1088/1468-6996/13/1/015001",
language = "English",
volume = "13",
pages = "015001_1--12",
journal = "Science and Technology of Advanced Materials",
issn = "1468-6996",
publisher = "Taylor & Francis",
number = "1",
}
RIS
TY - JOUR
T1 - Soft X-Ray Reflectometry, Hard X-Ray Photoelectron Spectroscopy, and HRTEM investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks
AU - Filatova, E.O.
AU - Kozhevnikov, I.V.
AU - Sokolov, A.A.
AU - Ubyivovk, E.V.
AU - S. Yulin, [Unknown]
AU - Gorgoi, M.
AU - Schaefers, F.
PY - 2012
Y1 - 2012
U2 - doi:10.1088/1468-6996/13/1/015001
DO - doi:10.1088/1468-6996/13/1/015001
M3 - Article
VL - 13
SP - 015001_1-12
JO - Science and Technology of Advanced Materials
JF - Science and Technology of Advanced Materials
SN - 1468-6996
IS - 1
ER -
