Ion-plasma methods of formation of piezosemiconductor ZnO thin films for acoustoelectronics and optoelectronics

DOI

https://doi.org/10.1088/1742-6596/1281/1/012025
Final published version

L. V. Grigoryev
I. S. Morozov
N. V. Zhuravlev
V. G. Nefedov
O. V. Shakin

The results of the study of thin nanostructured ZnO films obtained by the method of reactive ion-plasma sputtering are presented. The influence of technological factors on the structural and optical properties of films is considered.

Original language	English
Article number	012025
Journal	Journal of Physics: Conference Series
Volume	1281
Issue number	1
DOIs	https://doi.org/10.1088/1742-6596/1281/1/012025
State	Published - 12 Aug 2019
Event	14th International Conference on Films and Coatings, ICFC 2019 - Saint Petersburg, Russian Federation Duration: 14 May 2019 → 16 May 2019

Scopus subject areas

Physics and Astronomy(all)

ID: 86115190