TY - JOUR

T1 - The influence of porous silica substrate on the properties of alumina films studied by X-ray reflection spectroscopy

AU - Konashuk, A. S.

AU - Sokolov, A. A.

AU - Drozd, V. E.

AU - Romanov, A. A.

AU - Filatova, E. O.

PY - 2012/6/1

Y1 - 2012/6/1

N2 - The structure of alumina (Al 2O 3) films of various thicknesses grown by the atomic layer deposition method on porous silica (por-SiO 2) substrates has been studied using soft X-ray reflection spectroscopy. It is established that the synthesized films are amorphous and that the ratio of Al atoms with tetrahedral and octahedral coordinations in a film depends on its thickness. It can be suggested that thicker Al 2O 3 films contain a greater proportion of Al atoms with tetrahedral coordination.

AB - The structure of alumina (Al 2O 3) films of various thicknesses grown by the atomic layer deposition method on porous silica (por-SiO 2) substrates has been studied using soft X-ray reflection spectroscopy. It is established that the synthesized films are amorphous and that the ratio of Al atoms with tetrahedral and octahedral coordinations in a film depends on its thickness. It can be suggested that thicker Al 2O 3 films contain a greater proportion of Al atoms with tetrahedral coordination.

UR - http://www.scopus.com/inward/record.url?scp=84864138618&partnerID=8YFLogxK

U2 - 10.1134/S1063785012060235

DO - 10.1134/S1063785012060235

M3 - Article

VL - 38

SP - 562

EP - 564

JO - Technical Physics Letters

JF - Technical Physics Letters

SN - 1063-7850

IS - 6

ER -