A review is presented of ionic layer deposition, one of tbe methods of synthesising thin-layer structures of a predetermined composition with very precise thickness control on the surface of a support. Conditions for the synthesis of ultra-thin films of metal oxides, hydroxides, phosphates, chromates, sulphides, and tellurides on the surface of metals, semiconductors, and dielectrics are discussed. The advantages of the method are pointed out, including the possibility of synthesising layers in an automatic regime under mild conditions at room temperature on substrates of complex shape by using simple apparatus. The problems which prevent the wider use of the method are formulated, and ways of solving them are suggested. The bibliography includes 69 references.