Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Raman spectroscopy of monoatomic hydrogen at dislocations in silicon. / Vysotskii, N.; Loshachenko, A.; Borisov, E; Vyvenko, O.
в: Journal of Physics: Conference Series, Том 690, № 1, 2016, стр. 012004.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Raman spectroscopy of monoatomic hydrogen at dislocations in silicon
AU - Vysotskii, N.
AU - Loshachenko, A.
AU - Borisov, E
AU - Vyvenko, O.
PY - 2016
Y1 - 2016
N2 - A broad Raman peak at about 2000 cm-1 was found in hydrogenated silicon foils with a regular dislocation network (DN) produced by silicon wafer bonding. It was not observed in the reference foils without a dislocation network. The hydrogenation was performed from acid water solution at room temperature. The peak was ascribed to monoatomic hydrogen in silicon bond centered position that became stable in a close vicinity to the dislocation cores in opposite to the case of the regular lattice where its molecular form is energetically favorable.
AB - A broad Raman peak at about 2000 cm-1 was found in hydrogenated silicon foils with a regular dislocation network (DN) produced by silicon wafer bonding. It was not observed in the reference foils without a dislocation network. The hydrogenation was performed from acid water solution at room temperature. The peak was ascribed to monoatomic hydrogen in silicon bond centered position that became stable in a close vicinity to the dislocation cores in opposite to the case of the regular lattice where its molecular form is energetically favorable.
U2 - 10.1088/1742-6596/690/1/012004
DO - 10.1088/1742-6596/690/1/012004
M3 - Article
VL - 690
SP - 012004
JO - Journal of Physics: Conference Series
JF - Journal of Physics: Conference Series
SN - 1742-6588
IS - 1
ER -
ID: 7639063