Thermodynamic characteristics of hydrogen halide elimination from SiX ₄-NH₃ systems were calculated by the B3LYP density functional method. The role of adducts and oligomeric forms of compounds containing Si-N bonds, as intermediates in the chemical vapor deposition of silicon nitride, was considered. It was shown experimentally that the reaction between silicon tetrachloride and ammonia in non-aqueous solvents involves ammonolysis.