Standard

Effect of thermal annealing and Al2O3-interlayer on intermixing in the TiN/SiO2/Si structure. / Konyushenko, M.A.; Konashuk, A.S.; Sokolov, A.A.; Schaefers, F.; Filatova, E.O.

в: Journal of Electron Spectroscopy and Related Phenomena, Том 196, 17.12.2013, стр. 117-120.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

Harvard

Konyushenko, MA, Konashuk, AS, Sokolov, AA, Schaefers, F & Filatova, EO 2013, 'Effect of thermal annealing and Al2O3-interlayer on intermixing in the TiN/SiO2/Si structure', Journal of Electron Spectroscopy and Related Phenomena, Том. 196, стр. 117-120. https://doi.org/10.1016/j.elspec.2013.12.001, https://doi.org/10.1016/j.elspec.2013.12.001

APA

Konyushenko, M. A., Konashuk, A. S., Sokolov, A. A., Schaefers, F., & Filatova, E. O. (2013). Effect of thermal annealing and Al2O3-interlayer on intermixing in the TiN/SiO2/Si structure. Journal of Electron Spectroscopy and Related Phenomena, 196, 117-120. https://doi.org/10.1016/j.elspec.2013.12.001, https://doi.org/10.1016/j.elspec.2013.12.001

Vancouver

Konyushenko MA, Konashuk AS, Sokolov AA, Schaefers F, Filatova EO. Effect of thermal annealing and Al2O3-interlayer on intermixing in the TiN/SiO2/Si structure. Journal of Electron Spectroscopy and Related Phenomena. 2013 Дек. 17;196:117-120. https://doi.org/10.1016/j.elspec.2013.12.001, https://doi.org/10.1016/j.elspec.2013.12.001

Author

Konyushenko, M.A. ; Konashuk, A.S. ; Sokolov, A.A. ; Schaefers, F. ; Filatova, E.O. / Effect of thermal annealing and Al2O3-interlayer on intermixing in the TiN/SiO2/Si structure. в: Journal of Electron Spectroscopy and Related Phenomena. 2013 ; Том 196. стр. 117-120.

BibTeX

@article{9d852b97ae5043438a5cb43bea30b2e0,
title = "Effect of thermal annealing and Al2O3-interlayer on intermixing in the TiN/SiO2/Si structure",
author = "M.A. Konyushenko and A.S. Konashuk and A.A. Sokolov and F. Schaefers and E.O. Filatova",
year = "2013",
month = dec,
day = "17",
doi = "10.1016/j.elspec.2013.12.001",
language = "English",
volume = "196",
pages = "117--120",
journal = "Journal of Electron Spectroscopy and Related Phenomena",
issn = "0368-2048",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - Effect of thermal annealing and Al2O3-interlayer on intermixing in the TiN/SiO2/Si structure

AU - Konyushenko, M.A.

AU - Konashuk, A.S.

AU - Sokolov, A.A.

AU - Schaefers, F.

AU - Filatova, E.O.

PY - 2013/12/17

Y1 - 2013/12/17

U2 - 10.1016/j.elspec.2013.12.001

DO - 10.1016/j.elspec.2013.12.001

M3 - Article

VL - 196

SP - 117

EP - 120

JO - Journal of Electron Spectroscopy and Related Phenomena

JF - Journal of Electron Spectroscopy and Related Phenomena

SN - 0368-2048

ER -

ID: 6992528