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Effect of postannealing crystallization of FE:HfO2 on dynamics of HfxSi1-xO2 formation at SiO2/FE:HfO2 interface depending on valence of doping impurity. / Konashuk, A.S. ; Filatova, E.O. ; Bugaev, A.V. ; Sakhonenkov, S.S. .

2023. Реферат от 23rd CONFERENCE ON INSULATING FILMS ON SEMICONDUCTORS, Pizzo, Италия.

Результаты исследований: Материалы конференций › тезисы › Рецензирование

Harvard

Konashuk, AS, Filatova, EO, Bugaev, AV & Sakhonenkov, SS 2023, 'Effect of postannealing crystallization of FE:HfO2 on dynamics of HfxSi1-xO2 formation at SiO2/FE:HfO2 interface depending on valence of doping impurity', 23rd CONFERENCE ON INSULATING FILMS ON SEMICONDUCTORS, Pizzo, Италия, 27/06/23 - 30/06/23.

APA

Konashuk, A. S., Filatova, E. O., Bugaev, A. V., & Sakhonenkov, S. S. (2023). Effect of postannealing crystallization of FE:HfO2 on dynamics of HfxSi1-xO2 formation at SiO2/FE:HfO2 interface depending on valence of doping impurity. Реферат от 23rd CONFERENCE ON INSULATING FILMS ON SEMICONDUCTORS, Pizzo, Италия.

Vancouver

Konashuk AS, Filatova EO, Bugaev AV, Sakhonenkov SS. Effect of postannealing crystallization of FE:HfO2 on dynamics of HfxSi1-xO2 formation at SiO2/FE:HfO2 interface depending on valence of doping impurity. 2023. Реферат от 23rd CONFERENCE ON INSULATING FILMS ON SEMICONDUCTORS, Pizzo, Италия.

Author

Konashuk, A.S. ; Filatova, E.O. ; Bugaev, A.V. ; Sakhonenkov, S.S. . / Effect of postannealing crystallization of FE:HfO2 on dynamics of HfxSi1-xO2 formation at SiO2/FE:HfO2 interface depending on valence of doping impurity. Реферат от 23rd CONFERENCE ON INSULATING FILMS ON SEMICONDUCTORS, Pizzo, Италия.2 стр.

BibTeX

@conference{0ebe404e953842c29ee809362a8672ea,
title = "Effect of postannealing crystallization of FE:HfO2 on dynamics of HfxSi1-xO2 formation at SiO2/FE:HfO2 interface depending on valence of doping impurity",
author = "A.S. Konashuk and E.O. Filatova and A.V. Bugaev and S.S. Sakhonenkov",
year = "2023",
month = jun,
language = "English",
note = "null ; Conference date: 27-06-2023 Through 30-06-2023",
url = "https://events.dimes.unical.it/infos2023/",

}

RIS

TY - CONF

T1 - Effect of postannealing crystallization of FE:HfO2 on dynamics of HfxSi1-xO2 formation at SiO2/FE:HfO2 interface depending on valence of doping impurity

AU - Konashuk, A.S.

AU - Filatova, E.O.

AU - Bugaev, A.V.

AU - Sakhonenkov, S.S.

N1 - Conference code: 23

PY - 2023/6

Y1 - 2023/6

UR - https://events.dimes.unical.it/infos2023/wp-content/uploads/sites/20/2023/06/Final-program-INFOS-2023.pdf

M3 - Abstract

Y2 - 27 June 2023 through 30 June 2023

ER -

ID: 107329609