Selective absorption in thermally oxidized nanoporous silicon

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Selective absorption in thermally oxidized nanoporous silicon. / Mikhaǐlov, A. V.; Grigor'v, L. V.; Konorov, P. P.

In: Journal of Optical Technology (A Translation of Opticheskii Zhurnal), Vol. 79, No. 2, 29.02.2012, p. 99-101.

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Author

Mikhaǐlov, A. V. ; Grigor'v, L. V. ; Konorov, P. P. / Selective absorption in thermally oxidized nanoporous silicon. In: Journal of Optical Technology (A Translation of Opticheskii Zhurnal). 2012 ; Vol. 79, No. 2. pp. 99-101.

BibTeX

@article{cfee6fdc6a4849cd8973311b06865083,

title = "Selective absorption in thermally oxidized nanoporous silicon",

abstract = "This paper presents a study of the optical properties of thermally oxidized nanoporous silicon in the wavenumber range 5000-400 cm-1. It is shown for the first time that thermally oxidized nanoporous silicon has two broad regions of reduced transmittance in the wavenumber range from 3720 to 3000 cm-1 and five narrow zones that have their minima at the following wave numbers: 2920, 2240, 1680, 840, and 600 cm-1. The transmittance spectra of the thermally oxidized SiO2-Si structure are measured in the wavenumber range 5000-400 cm-1. It is established that the thermally oxidized SiO2-Si structure is transparent in the wavenumber range 5000-1200 cm-1 and has narrow absorption peaks insignificant in magnitude at 1090 cm-1 and 620 cm-1. It is shown that thermally oxidized nanoporous silicon can be used as a selectively absorbing and recording medium in the IR range.",

author = "Mikhaǐlov, {A. V.} and Grigor'v, {L. V.} and Konorov, {P. P.}",

year = "2012",

month = feb,

day = "29",

doi = "10.1364/jot.79.000099",

language = "English",

volume = "79",

pages = "99--101",

journal = "Journal of Optical Technology (A Translation of Opticheskii Zhurnal)",

issn = "1070-9762",

publisher = "The Optical Society",

number = "2",

}

RIS

TY - JOUR

T1 - Selective absorption in thermally oxidized nanoporous silicon

AU - Mikhaǐlov, A. V.

AU - Grigor'v, L. V.

AU - Konorov, P. P.

PY - 2012/2/29

Y1 - 2012/2/29

N2 - This paper presents a study of the optical properties of thermally oxidized nanoporous silicon in the wavenumber range 5000-400 cm-1. It is shown for the first time that thermally oxidized nanoporous silicon has two broad regions of reduced transmittance in the wavenumber range from 3720 to 3000 cm-1 and five narrow zones that have their minima at the following wave numbers: 2920, 2240, 1680, 840, and 600 cm-1. The transmittance spectra of the thermally oxidized SiO2-Si structure are measured in the wavenumber range 5000-400 cm-1. It is established that the thermally oxidized SiO2-Si structure is transparent in the wavenumber range 5000-1200 cm-1 and has narrow absorption peaks insignificant in magnitude at 1090 cm-1 and 620 cm-1. It is shown that thermally oxidized nanoporous silicon can be used as a selectively absorbing and recording medium in the IR range.

AB - This paper presents a study of the optical properties of thermally oxidized nanoporous silicon in the wavenumber range 5000-400 cm-1. It is shown for the first time that thermally oxidized nanoporous silicon has two broad regions of reduced transmittance in the wavenumber range from 3720 to 3000 cm-1 and five narrow zones that have their minima at the following wave numbers: 2920, 2240, 1680, 840, and 600 cm-1. The transmittance spectra of the thermally oxidized SiO2-Si structure are measured in the wavenumber range 5000-400 cm-1. It is established that the thermally oxidized SiO2-Si structure is transparent in the wavenumber range 5000-1200 cm-1 and has narrow absorption peaks insignificant in magnitude at 1090 cm-1 and 620 cm-1. It is shown that thermally oxidized nanoporous silicon can be used as a selectively absorbing and recording medium in the IR range.

UR - http://www.scopus.com/inward/record.url?scp=84858684184&partnerID=8YFLogxK

U2 - 10.1364/jot.79.000099

DO - 10.1364/jot.79.000099

M3 - Article

AN - SCOPUS:84858684184

VL - 79

SP - 99

EP - 101

JO - Journal of Optical Technology (A Translation of Opticheskii Zhurnal)

JF - Journal of Optical Technology (A Translation of Opticheskii Zhurnal)

SN - 1070-9762

IS - 2

ER -

ID: 86117706