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This paper presents a study of the optical properties of thermally oxidized nanoporous silicon in the wavenumber range 5000-400 cm-1. It is shown for the first time that thermally oxidized nanoporous silicon has two broad regions of reduced transmittance in the wavenumber range from 3720 to 3000 cm-1 and five narrow zones that have their minima at the following wave numbers: 2920, 2240, 1680, 840, and 600 cm-1. The transmittance spectra of the thermally oxidized SiO2-Si structure are measured in the wavenumber range 5000-400 cm-1. It is established that the thermally oxidized SiO2-Si structure is transparent in the wavenumber range 5000-1200 cm-1 and has narrow absorption peaks insignificant in magnitude at 1090 cm-1 and 620 cm-1. It is shown that thermally oxidized nanoporous silicon can be used as a selectively absorbing and recording medium in the IR range.
Original language | English |
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Pages (from-to) | 99-101 |
Number of pages | 3 |
Journal | Journal of Optical Technology (A Translation of Opticheskii Zhurnal) |
Volume | 79 |
Issue number | 2 |
DOIs | |
State | Published - 29 Feb 2012 |
ID: 86117706