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On the possibility of applying kinoform elements in mirror projectors for EUV lithography. / Venediktov, V. Yu.

In: Technical Physics, Vol. 52, No. 1, 01.2007, p. 126-128.

Research output: Contribution to journal › Article › peer-review

Harvard

Venediktov, VY 2007, 'On the possibility of applying kinoform elements in mirror projectors for EUV lithography', Technical Physics, vol. 52, no. 1, pp. 126-128. https://doi.org/10.1134/S1063784207010239

APA

Venediktov, V. Y. (2007). On the possibility of applying kinoform elements in mirror projectors for EUV lithography. Technical Physics, 52(1), 126-128. https://doi.org/10.1134/S1063784207010239

Vancouver

Venediktov VY. On the possibility of applying kinoform elements in mirror projectors for EUV lithography. Technical Physics. 2007 Jan;52(1):126-128. https://doi.org/10.1134/S1063784207010239

Author

Venediktov, V. Yu. / On the possibility of applying kinoform elements in mirror projectors for EUV lithography. In: Technical Physics. 2007 ; Vol. 52, No. 1. pp. 126-128.

BibTeX

@article{5e32f9f77bc24d6d89139daec05593c9,
title = "On the possibility of applying kinoform elements in mirror projectors for EUV lithography",
abstract = "The potential of the technology of reflective diffraction (holographic) optical elements intended for the EUV range is considered, and their application in projection lithography is discussed.",
author = "Venediktov, {V. Yu}",
note = "Funding Information: ACKNOWLEDGMENTS I thank A.A. Starkov and A.P. Zhevlakov for useful discussion. This work was supported in part by the ISTC, grant no. 991.",
year = "2007",
month = jan,
doi = "10.1134/S1063784207010239",
language = "English",
volume = "52",
pages = "126--128",
journal = "Technical Physics",
issn = "1063-7842",
publisher = "Pleiades Publishing",
number = "1",

}

RIS

TY - JOUR

T1 - On the possibility of applying kinoform elements in mirror projectors for EUV lithography

AU - Venediktov, V. Yu

N1 - Funding Information: ACKNOWLEDGMENTS I thank A.A. Starkov and A.P. Zhevlakov for useful discussion. This work was supported in part by the ISTC, grant no. 991.

PY - 2007/1

Y1 - 2007/1

N2 - The potential of the technology of reflective diffraction (holographic) optical elements intended for the EUV range is considered, and their application in projection lithography is discussed.

AB - The potential of the technology of reflective diffraction (holographic) optical elements intended for the EUV range is considered, and their application in projection lithography is discussed.

UR - http://www.scopus.com/inward/record.url?scp=33846195847&partnerID=8YFLogxK

U2 - 10.1134/S1063784207010239

DO - 10.1134/S1063784207010239

M3 - Article

VL - 52

SP - 126

EP - 128

JO - Technical Physics

JF - Technical Physics

SN - 1063-7842

IS - 1

ER -

ID: 5326152