Research output: Contribution to journal › Article › peer-review
The potential of the technology of reflective diffraction (holographic) optical elements intended for the EUV range is considered, and their application in projection lithography is discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 126-128 |
| Number of pages | 3 |
| Journal | Technical Physics |
| Volume | 52 |
| Issue number | 1 |
| DOIs | |
| State | Published - Jan 2007 |
ID: 5326152