Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Research › peer-review
Numerical simulation of surface morphology of two-tier microsized matrix structure of SiC FEA. / Никифоров, Константин Аркадьевич; Сайфуллин, Марат Фанилович; Чумак, Максим.
33rd International Vacuum Nanoelectronics Conference, IVNC 2020. Institute of Electrical and Electronics Engineers Inc., 2020. 9203144.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Research › peer-review
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TY - GEN
T1 - Numerical simulation of surface morphology of two-tier microsized matrix structure of SiC FEA
AU - Никифоров, Константин Аркадьевич
AU - Сайфуллин, Марат Фанилович
AU - Чумак, Максим
N1 - Publisher Copyright: © 2020 IEEE.
PY - 2020/7
Y1 - 2020/7
N2 - Numerical simulation is based on AFM data of surface morphology of silicon carbide field emission array (FEA) with two-tier microstructure made by SPETU LETI technology. Using COMSOL Multiphysics, the procedure for import AFM data into simulation environment is developed and the corresponding mathematical model of emission surface is constructed. Numerical model is investigated for computational mesh convergence using the calculation of electric field strength distribution by the finite element method. The optimal size of finite elements is revealed, at which the best convergence of the numerical solution is achieved, and AFM data interpolation parameters are investigated.
AB - Numerical simulation is based on AFM data of surface morphology of silicon carbide field emission array (FEA) with two-tier microstructure made by SPETU LETI technology. Using COMSOL Multiphysics, the procedure for import AFM data into simulation environment is developed and the corresponding mathematical model of emission surface is constructed. Numerical model is investigated for computational mesh convergence using the calculation of electric field strength distribution by the finite element method. The optimal size of finite elements is revealed, at which the best convergence of the numerical solution is achieved, and AFM data interpolation parameters are investigated.
KW - AFM
KW - Atomic force microscopy
KW - FEA
KW - Field emission array
KW - Finite element method
KW - Mathematical modelling
KW - Mesh convergence
KW - Numerical simulation
KW - Silicon carbide
KW - Surface morphology
UR - http://www.scopus.com/inward/record.url?scp=85092724136&partnerID=8YFLogxK
UR - https://www.mendeley.com/catalogue/e7f5981b-e9ea-39d5-8033-f9a63b88c8be/
U2 - 10.1109/IVNC49440.2020.9203144
DO - 10.1109/IVNC49440.2020.9203144
M3 - Conference contribution
BT - 33rd International Vacuum Nanoelectronics Conference, IVNC 2020
PB - Institute of Electrical and Electronics Engineers Inc.
ER -
ID: 69856733