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Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography. / Andreev, A. A.; Limpouch, J.; Voznesensky, N. B.; Zhevlakov, A. P.; Yashin, V. E.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 5196, 2004, p. 128-136.

Research output: Contribution to journal › Conference article › peer-review

Harvard

Andreev, AA, Limpouch, J, Voznesensky, NB, Zhevlakov, AP & Yashin, VE 2004, 'Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography', Proceedings of SPIE - The International Society for Optical Engineering, vol. 5196, pp. 128-136. https://doi.org/10.1117/12.512456

APA

Andreev, A. A., Limpouch, J., Voznesensky, N. B., Zhevlakov, A. P., & Yashin, V. E. (2004). Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography. Proceedings of SPIE - The International Society for Optical Engineering, 5196, 128-136. https://doi.org/10.1117/12.512456

Vancouver

Andreev AA, Limpouch J, Voznesensky NB, Zhevlakov AP, Yashin VE. Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography. Proceedings of SPIE - The International Society for Optical Engineering. 2004;5196:128-136. https://doi.org/10.1117/12.512456

Author

Andreev, A. A. ; Limpouch, J. ; Voznesensky, N. B. ; Zhevlakov, A. P. ; Yashin, V. E. / Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography. In: Proceedings of SPIE - The International Society for Optical Engineering. 2004 ; Vol. 5196. pp. 128-136.

BibTeX

@article{408be943cc3d44c3828a53b33e03434a,
title = "Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography",
abstract = "The advantages of droplet and claster Li-contained targets for debris free EUV generation are estimated on base of analytical modeling and simulation. Conversion efficiency of laser energy into EUV energy from such targets is found to reach a few percents. The laser prepulse is proposed to enhance the laser energy conversion into emission at wavelength of 13.5 nm.",
keywords = "Amplifier, Claster, Conversion, Droplet, Laser produced plasma, Line emission, Master oscillator, Nanolithography",
author = "Andreev, {A. A.} and J. Limpouch and Voznesensky, {N. B.} and Zhevlakov, {A. P.} and Yashin, {V. E.}",
year = "2004",
doi = "10.1117/12.512456",
language = "English",
volume = "5196",
pages = "128--136",
journal = "Proceedings of SPIE - The International Society for Optical Engineering",
issn = "0277-786X",
publisher = "SPIE",
note = "Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications ; Conference date: 04-08-2003 Through 06-08-2003",

}

RIS

TY - JOUR

T1 - Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography

AU - Andreev, A. A.

AU - Limpouch, J.

AU - Voznesensky, N. B.

AU - Zhevlakov, A. P.

AU - Yashin, V. E.

PY - 2004

Y1 - 2004

N2 - The advantages of droplet and claster Li-contained targets for debris free EUV generation are estimated on base of analytical modeling and simulation. Conversion efficiency of laser energy into EUV energy from such targets is found to reach a few percents. The laser prepulse is proposed to enhance the laser energy conversion into emission at wavelength of 13.5 nm.

AB - The advantages of droplet and claster Li-contained targets for debris free EUV generation are estimated on base of analytical modeling and simulation. Conversion efficiency of laser energy into EUV energy from such targets is found to reach a few percents. The laser prepulse is proposed to enhance the laser energy conversion into emission at wavelength of 13.5 nm.

KW - Amplifier

KW - Claster

KW - Conversion

KW - Droplet

KW - Laser produced plasma

KW - Line emission

KW - Master oscillator

KW - Nanolithography

UR - http://www.scopus.com/inward/record.url?scp=1942422141&partnerID=8YFLogxK

U2 - 10.1117/12.512456

DO - 10.1117/12.512456

M3 - Conference article

AN - SCOPUS:1942422141

VL - 5196

SP - 128

EP - 136

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

SN - 0277-786X

T2 - Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications

Y2 - 4 August 2003 through 6 August 2003

ER -

ID: 86382080