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Effect of helium ion beam treatment on the etching rate of silicon nitride. / Petrov, Yu.V.; Sharov, T.V.; Baraban, A.P.; Vyvenko, O.F.

In: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol. 349, 2015, p. 90-95.

Research output: Contribution to journal › Article

Harvard

Petrov, YV, Sharov, TV, Baraban, AP & Vyvenko, OF 2015, 'Effect of helium ion beam treatment on the etching rate of silicon nitride', NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, vol. 349, pp. 90-95. https://doi.org/10.1016/j.nimb.2015.02.054

APA

Petrov, Y. V., Sharov, T. V., Baraban, A. P., & Vyvenko, O. F. (2015). Effect of helium ion beam treatment on the etching rate of silicon nitride. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 349, 90-95. https://doi.org/10.1016/j.nimb.2015.02.054

Vancouver

Petrov YV, Sharov TV, Baraban AP, Vyvenko OF. Effect of helium ion beam treatment on the etching rate of silicon nitride. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS. 2015;349:90-95. https://doi.org/10.1016/j.nimb.2015.02.054

Author

Petrov, Yu.V. ; Sharov, T.V. ; Baraban, A.P. ; Vyvenko, O.F. / Effect of helium ion beam treatment on the etching rate of silicon nitride. In: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS. 2015 ; Vol. 349. pp. 90-95.

BibTeX

@article{6af7779c0c4b4ceaa5c6f72a45fdad7e,
title = "Effect of helium ion beam treatment on the etching rate of silicon nitride",
author = "Yu.V. Petrov and T.V. Sharov and A.P. Baraban and O.F. Vyvenko",
year = "2015",
doi = "10.1016/j.nimb.2015.02.054",
language = "English",
volume = "349",
pages = "90--95",
journal = "NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS",
issn = "0168-583X",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - Effect of helium ion beam treatment on the etching rate of silicon nitride

AU - Petrov, Yu.V.

AU - Sharov, T.V.

AU - Baraban, A.P.

AU - Vyvenko, O.F.

PY - 2015

Y1 - 2015

U2 - 10.1016/j.nimb.2015.02.054

DO - 10.1016/j.nimb.2015.02.054

M3 - Article

VL - 349

SP - 90

EP - 95

JO - NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

JF - NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

SN - 0168-583X

ER -

ID: 3927622