Effect of helium ion beam treatment on the etching rate of silicon nitride

Original language	English
Pages (from-to)	90-95
Journal	NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Volume	349
DOIs	https://doi.org/10.1016/j.nimb.2015.02.054
State	Published - 2015

ID: 3927622