Research output: Contribution to journal › Article › peer-review
Commercial-Grade Dielectrics Surface Metallization by Direct Laser Deposition from Deep Eutectic Solvents. / Avilova, Ekaterina A.; Khairullina, Evgeniia M.; Levshakova, Aleksandra S.; Eltysheva, Elizaveta A.; Zaikina, Margarita A.; Logunov, Lev S.; Ostendorf, Andreas; Sinev, Dmitry A.; Tumkin, Ilya I.
In: ACS Applied Electronic Materials, Vol. 6, No. 6, 25.06.2024, p. 4239-4246.Research output: Contribution to journal › Article › peer-review
}
TY - JOUR
T1 - Commercial-Grade Dielectrics Surface Metallization by Direct Laser Deposition from Deep Eutectic Solvents
AU - Avilova, Ekaterina A.
AU - Khairullina, Evgeniia M.
AU - Levshakova, Aleksandra S.
AU - Eltysheva, Elizaveta A.
AU - Zaikina, Margarita A.
AU - Logunov, Lev S.
AU - Ostendorf, Andreas
AU - Sinev, Dmitry A.
AU - Tumkin, Ilya I.
PY - 2024/6/25
Y1 - 2024/6/25
N2 - In this study, we explore the feasibility of a promising approach to fabricate conductive copper patterns with arbitrary topology on various dielectric substrates using direct laser metallization from deep eutectic solvents. We demonstrate the capability to print on industrially relevant dielectric materials, including polyimide, fiberglass plastic, and polytetrafluoroethylene (PTFE) substrates. We investigate the geometric and electrical characteristics of the resulting patterns and their composition. Our findings highlight the significant influence of the substrate material on both the formation rate of structures and their final properties. The characteristic resistance of the fabricated copper patterns is in the range from 0.23 to 1.64 Ω × mm2/m. The rate of pattern formation varied from 0.5 to 3.5 mm/s, depending on the substrate used.
AB - In this study, we explore the feasibility of a promising approach to fabricate conductive copper patterns with arbitrary topology on various dielectric substrates using direct laser metallization from deep eutectic solvents. We demonstrate the capability to print on industrially relevant dielectric materials, including polyimide, fiberglass plastic, and polytetrafluoroethylene (PTFE) substrates. We investigate the geometric and electrical characteristics of the resulting patterns and their composition. Our findings highlight the significant influence of the substrate material on both the formation rate of structures and their final properties. The characteristic resistance of the fabricated copper patterns is in the range from 0.23 to 1.64 Ω × mm2/m. The rate of pattern formation varied from 0.5 to 3.5 mm/s, depending on the substrate used.
KW - copper
KW - deep eutectic solvents
KW - direct laser metallization
KW - direct laser writing
KW - laser-induced metal deposition
KW - printed circuit boards
UR - https://www.mendeley.com/catalogue/4b614178-adbd-345f-94a2-213c56ad582a/
U2 - 10.1021/acsaelm.4c00337
DO - 10.1021/acsaelm.4c00337
M3 - Article
VL - 6
SP - 4239
EP - 4246
JO - ACS Applied Electronic Materials
JF - ACS Applied Electronic Materials
SN - 2637-6113
IS - 6
ER -
ID: 122949732