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Can pulsed laser deposition serve as an advanced technique in fabricating chemical sensors? / Schöning, M. J.; Mourzina, Yu G.; Schubert, J.; Zander, W.; Legin, A.; Vlasov, Yu G.; Lüth, H.

In: Sensors and Actuators, B: Chemical, Vol. 78, No. 1-3, 30.08.2001, p. 273-278.

Research output: Contribution to journal › Article › peer-review

Harvard

Schöning, MJ, Mourzina, YG, Schubert, J, Zander, W, Legin, A, Vlasov, YG & Lüth, H 2001, 'Can pulsed laser deposition serve as an advanced technique in fabricating chemical sensors?', Sensors and Actuators, B: Chemical, vol. 78, no. 1-3, pp. 273-278. https://doi.org/10.1016/S0925-4005(01)00825-5

APA

Schöning, M. J., Mourzina, Y. G., Schubert, J., Zander, W., Legin, A., Vlasov, Y. G., & Lüth, H. (2001). Can pulsed laser deposition serve as an advanced technique in fabricating chemical sensors? Sensors and Actuators, B: Chemical, 78(1-3), 273-278. https://doi.org/10.1016/S0925-4005(01)00825-5

Vancouver

Schöning MJ, Mourzina YG, Schubert J, Zander W, Legin A, Vlasov YG et al. Can pulsed laser deposition serve as an advanced technique in fabricating chemical sensors? Sensors and Actuators, B: Chemical. 2001 Aug 30;78(1-3):273-278. https://doi.org/10.1016/S0925-4005(01)00825-5

Author

Schöning, M. J. ; Mourzina, Yu G. ; Schubert, J. ; Zander, W. ; Legin, A. ; Vlasov, Yu G. ; Lüth, H. / Can pulsed laser deposition serve as an advanced technique in fabricating chemical sensors?. In: Sensors and Actuators, B: Chemical. 2001 ; Vol. 78, No. 1-3. pp. 273-278.

BibTeX

@article{97a2667589c44940931f5f399e94fcb3,
title = "Can pulsed laser deposition serve as an advanced technique in fabricating chemical sensors?",
abstract = "The pulsed laser deposition (PLD) technique has been investigated as an alternative semiconductor-compatible fabrication technique in order to realise different thin film materials for chemical sensor applications. As two examples, Ta2O5 and Al2O3 layers on top of capacitive Si/SiO2 structures and chalcogenide glass layers on metallised Si substrates, show a nearly-Nernstian pH sensitivity of about 55-58 mV per decade and a high sensitivity towards heavy metal ions of about 25-29 and 56-60 mV per decade, respectively. The layer thickness of the sensor materials is in the nanometer range. Even multi-component systems consisting of up to five different materials can be stoichiometrically deposited. Besides the electrochemical sensor characterisation, Rutherford backscattering spectrometry (RBS), ion channelling experiments, X-ray diffractometry and transmission electron microscopy (TEM) have been performed in order to study the physical layer structure of the pulsed laser-deposited thin film materials.",
keywords = "Heavy metal determination, pH, Pulsed laser deposition technique, Silicon technology, Thin film sensor",
author = "Sch{\"o}ning, {M. J.} and Mourzina, {Yu G.} and J. Schubert and W. Zander and A. Legin and Vlasov, {Yu G.} and H. L{\"u}th",
year = "2001",
month = aug,
day = "30",
doi = "10.1016/S0925-4005(01)00825-5",
language = "English",
volume = "78",
pages = "273--278",
journal = "Sensors and Actuators, B: Chemical",
issn = "0925-4005",
publisher = "Elsevier",
number = "1-3",

}

RIS

TY - JOUR

T1 - Can pulsed laser deposition serve as an advanced technique in fabricating chemical sensors?

AU - Schöning, M. J.

AU - Mourzina, Yu G.

AU - Schubert, J.

AU - Zander, W.

AU - Legin, A.

AU - Vlasov, Yu G.

AU - Lüth, H.

PY - 2001/8/30

Y1 - 2001/8/30

N2 - The pulsed laser deposition (PLD) technique has been investigated as an alternative semiconductor-compatible fabrication technique in order to realise different thin film materials for chemical sensor applications. As two examples, Ta2O5 and Al2O3 layers on top of capacitive Si/SiO2 structures and chalcogenide glass layers on metallised Si substrates, show a nearly-Nernstian pH sensitivity of about 55-58 mV per decade and a high sensitivity towards heavy metal ions of about 25-29 and 56-60 mV per decade, respectively. The layer thickness of the sensor materials is in the nanometer range. Even multi-component systems consisting of up to five different materials can be stoichiometrically deposited. Besides the electrochemical sensor characterisation, Rutherford backscattering spectrometry (RBS), ion channelling experiments, X-ray diffractometry and transmission electron microscopy (TEM) have been performed in order to study the physical layer structure of the pulsed laser-deposited thin film materials.

AB - The pulsed laser deposition (PLD) technique has been investigated as an alternative semiconductor-compatible fabrication technique in order to realise different thin film materials for chemical sensor applications. As two examples, Ta2O5 and Al2O3 layers on top of capacitive Si/SiO2 structures and chalcogenide glass layers on metallised Si substrates, show a nearly-Nernstian pH sensitivity of about 55-58 mV per decade and a high sensitivity towards heavy metal ions of about 25-29 and 56-60 mV per decade, respectively. The layer thickness of the sensor materials is in the nanometer range. Even multi-component systems consisting of up to five different materials can be stoichiometrically deposited. Besides the electrochemical sensor characterisation, Rutherford backscattering spectrometry (RBS), ion channelling experiments, X-ray diffractometry and transmission electron microscopy (TEM) have been performed in order to study the physical layer structure of the pulsed laser-deposited thin film materials.

KW - Heavy metal determination

KW - pH

KW - Pulsed laser deposition technique

KW - Silicon technology

KW - Thin film sensor

UR - http://www.scopus.com/inward/record.url?scp=0035975029&partnerID=8YFLogxK

U2 - 10.1016/S0925-4005(01)00825-5

DO - 10.1016/S0925-4005(01)00825-5

M3 - Article

AN - SCOPUS:0035975029

VL - 78

SP - 273

EP - 278

JO - Sensors and Actuators, B: Chemical

JF - Sensors and Actuators, B: Chemical

SN - 0925-4005

IS - 1-3

ER -

ID: 30515877