Standard

Vapor deposition of technetium coatings by thermolysis of volatile carbonyl complexes : I. Conditions and efficiency of coating deposition from various starting compounds. / Sidorenko, G. V.; Miroslavov, A. E.; Suglobov, D. N.

в: Radiochemistry, Том 51, № 6, 12.2009, стр. 576-582.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

Harvard

Sidorenko, GV, Miroslavov, AE & Suglobov, DN 2009, 'Vapor deposition of technetium coatings by thermolysis of volatile carbonyl complexes: I. Conditions and efficiency of coating deposition from various starting compounds', Radiochemistry, Том. 51, № 6, стр. 576-582. https://doi.org/10.1134/S1066362209060046

APA

Sidorenko, G. V., Miroslavov, A. E., & Suglobov, D. N. (2009). Vapor deposition of technetium coatings by thermolysis of volatile carbonyl complexes: I. Conditions and efficiency of coating deposition from various starting compounds. Radiochemistry, 51(6), 576-582. https://doi.org/10.1134/S1066362209060046

Vancouver

Sidorenko GV, Miroslavov AE, Suglobov DN. Vapor deposition of technetium coatings by thermolysis of volatile carbonyl complexes: I. Conditions and efficiency of coating deposition from various starting compounds. Radiochemistry. 2009 Дек.;51(6):576-582. https://doi.org/10.1134/S1066362209060046

Author

Sidorenko, G. V. ; Miroslavov, A. E. ; Suglobov, D. N. / Vapor deposition of technetium coatings by thermolysis of volatile carbonyl complexes : I. Conditions and efficiency of coating deposition from various starting compounds. в: Radiochemistry. 2009 ; Том 51, № 6. стр. 576-582.

BibTeX

@article{bef38caf78b1484a9688342ac90b53d3,
title = "Vapor deposition of technetium coatings by thermolysis of volatile carbonyl complexes: I. Conditions and efficiency of coating deposition from various starting compounds",
abstract = "Technetium carbonyl complexes [TcBr(CO)5], [TcI(CO)5], [TcX(CO)3]4 (X = Cl, Br, I), [TcBr(CO)3en] (en = ethylenediamine), [Tc(RCOCHCOR′)(CO)3(Et2NH)] [R = CH3 or C(CH3)3, R′ = CF3], Tc2(CO)10, and [Tc(C5H5)(CO)3] were tested as starting compounds for chemical vapor deposition of technetium coatings. The conditions of deposition of technetium coatings were determined, and the deposition yields were evaluated.",
keywords = "Carbonyls, Chemical vapor deposition, Coatings, Technetium",
author = "Sidorenko, {G. V.} and Miroslavov, {A. E.} and Suglobov, {D. N.}",
note = "Copyright: Copyright 2010 Elsevier B.V., All rights reserved.",
year = "2009",
month = dec,
doi = "10.1134/S1066362209060046",
language = "English",
volume = "51",
pages = "576--582",
journal = "Radiochemistry",
issn = "1066-3622",
publisher = "МАИК {"}Наука/Интерпериодика{"}",
number = "6",

}

RIS

TY - JOUR

T1 - Vapor deposition of technetium coatings by thermolysis of volatile carbonyl complexes

T2 - I. Conditions and efficiency of coating deposition from various starting compounds

AU - Sidorenko, G. V.

AU - Miroslavov, A. E.

AU - Suglobov, D. N.

N1 - Copyright: Copyright 2010 Elsevier B.V., All rights reserved.

PY - 2009/12

Y1 - 2009/12

N2 - Technetium carbonyl complexes [TcBr(CO)5], [TcI(CO)5], [TcX(CO)3]4 (X = Cl, Br, I), [TcBr(CO)3en] (en = ethylenediamine), [Tc(RCOCHCOR′)(CO)3(Et2NH)] [R = CH3 or C(CH3)3, R′ = CF3], Tc2(CO)10, and [Tc(C5H5)(CO)3] were tested as starting compounds for chemical vapor deposition of technetium coatings. The conditions of deposition of technetium coatings were determined, and the deposition yields were evaluated.

AB - Technetium carbonyl complexes [TcBr(CO)5], [TcI(CO)5], [TcX(CO)3]4 (X = Cl, Br, I), [TcBr(CO)3en] (en = ethylenediamine), [Tc(RCOCHCOR′)(CO)3(Et2NH)] [R = CH3 or C(CH3)3, R′ = CF3], Tc2(CO)10, and [Tc(C5H5)(CO)3] were tested as starting compounds for chemical vapor deposition of technetium coatings. The conditions of deposition of technetium coatings were determined, and the deposition yields were evaluated.

KW - Carbonyls

KW - Chemical vapor deposition

KW - Coatings

KW - Technetium

UR - http://www.scopus.com/inward/record.url?scp=75749148451&partnerID=8YFLogxK

U2 - 10.1134/S1066362209060046

DO - 10.1134/S1066362209060046

M3 - Article

AN - SCOPUS:75749148451

VL - 51

SP - 576

EP - 582

JO - Radiochemistry

JF - Radiochemistry

SN - 1066-3622

IS - 6

ER -

ID: 76835290