Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Synthesis and properties of hydrogenated aluminum thin film by reactive sputtering. / Baraban, A. P.; Dobrotvorskii, M. A.; Elets, D. I.; Gabis, I. E.; Kuznetsov, V. G.; Piven, V. A.; Voyt, A. P.; Selivanov, A. A.
в: Thin Solid Films, Том 709, 138217, 01.09.2020.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Synthesis and properties of hydrogenated aluminum thin film by reactive sputtering
AU - Baraban, A. P.
AU - Dobrotvorskii, M. A.
AU - Elets, D. I.
AU - Gabis, I. E.
AU - Kuznetsov, V. G.
AU - Piven, V. A.
AU - Voyt, A. P.
AU - Selivanov, A. A.
PY - 2020/9/1
Y1 - 2020/9/1
N2 - The synthesis procedure of a thin aluminum-hydrogen film on a silicon substrate is described and its result thoroughly investigated by a number of experimental methods. The reactive sputtering deposition was carried out to obtain a structure containing aluminum hydride. The resulting film has characteristic non-metallic properties, though according to thermal desorption studies its hydrogen content is close to AlH1.1, which is lower than stoichiometric aluminum hydride AlH3. Thermal desorption of hydrogen differs significantly from that of AlH3 powder as it has not one but several peaks. According to transmission electron microscopy the film is mostly amorphous but contains crystalline phase. Our interpretation of the experimental data suggests that some hydride phase microcrystals were formed as the film was deposited, but most hydrogen was stored inside the film without forming a crystalline structure in both bounded and unbounded states. The luminescent properties of the synthesized film are similar to aluminum hydride, and it can be concluded that the amorphous Al-H structure of the synthesized film shows resemblance with AlH3 crystals populated with hydrogen vacancies.
AB - The synthesis procedure of a thin aluminum-hydrogen film on a silicon substrate is described and its result thoroughly investigated by a number of experimental methods. The reactive sputtering deposition was carried out to obtain a structure containing aluminum hydride. The resulting film has characteristic non-metallic properties, though according to thermal desorption studies its hydrogen content is close to AlH1.1, which is lower than stoichiometric aluminum hydride AlH3. Thermal desorption of hydrogen differs significantly from that of AlH3 powder as it has not one but several peaks. According to transmission electron microscopy the film is mostly amorphous but contains crystalline phase. Our interpretation of the experimental data suggests that some hydride phase microcrystals were formed as the film was deposited, but most hydrogen was stored inside the film without forming a crystalline structure in both bounded and unbounded states. The luminescent properties of the synthesized film are similar to aluminum hydride, and it can be concluded that the amorphous Al-H structure of the synthesized film shows resemblance with AlH3 crystals populated with hydrogen vacancies.
KW - Alane
KW - Hydrogen storage
KW - Reactive sputtering
KW - Thin films
KW - IRRADIATION
KW - SURFACE
KW - AL
UR - http://www.scopus.com/inward/record.url?scp=85087592017&partnerID=8YFLogxK
U2 - 10.1016/j.tsf.2020.138217
DO - 10.1016/j.tsf.2020.138217
M3 - Article
AN - SCOPUS:85087592017
VL - 709
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
M1 - 138217
ER -
ID: 60774913