Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Study of the crystal and electronic structure of graphene films grown on 6H-SiC (0001). / Davydov, V. Yu; Usachov, D. Yu; Lebedev, S. P.; Smirnov, A. N.; Levitskii, V. S.; Eliseyev, I. A.; Alekseev, P. A.; Dunaevskiy, M. S.; Vilkov, O. Yu; Rybkin, A. G.; Lebedev, A. A.
в: Semiconductors, Том 51, № 8, 01.08.2017, стр. 1072-1080.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Study of the crystal and electronic structure of graphene films grown on 6H-SiC (0001)
AU - Davydov, V. Yu
AU - Usachov, D. Yu
AU - Lebedev, S. P.
AU - Smirnov, A. N.
AU - Levitskii, V. S.
AU - Eliseyev, I. A.
AU - Alekseev, P. A.
AU - Dunaevskiy, M. S.
AU - Vilkov, O. Yu
AU - Rybkin, A. G.
AU - Lebedev, A. A.
PY - 2017/8/1
Y1 - 2017/8/1
N2 - The structural, chemical, and electronic properties of epitaxial graphene films grown by thermal decomposition of the Si-face of a semi-insulating 6H-SiC substrate in an argon environment are studied by Raman spectroscopy, atomic-force microscopy, the low-energy electron diffraction method, X-ray photoelectron spectroscopy, angle-resolved photoemission spectroscopy and X-ray absorption spectroscopy at the carbon K edge. It is shown that the results of a systematic integrated study make it possible to optimize the growth parameters and develop a reliable technology for the growth of high-quality single-layer graphene films with a small fraction of bilayer graphene inclusions.
AB - The structural, chemical, and electronic properties of epitaxial graphene films grown by thermal decomposition of the Si-face of a semi-insulating 6H-SiC substrate in an argon environment are studied by Raman spectroscopy, atomic-force microscopy, the low-energy electron diffraction method, X-ray photoelectron spectroscopy, angle-resolved photoemission spectroscopy and X-ray absorption spectroscopy at the carbon K edge. It is shown that the results of a systematic integrated study make it possible to optimize the growth parameters and develop a reliable technology for the growth of high-quality single-layer graphene films with a small fraction of bilayer graphene inclusions.
UR - http://www.scopus.com/inward/record.url?scp=85028356828&partnerID=8YFLogxK
U2 - 10.1134/S1063782617080073
DO - 10.1134/S1063782617080073
M3 - Article
AN - SCOPUS:85028356828
VL - 51
SP - 1072
EP - 1080
JO - Semiconductors
JF - Semiconductors
SN - 1063-7826
IS - 8
ER -
ID: 9216761