TY - JOUR

T1 - Plasma assisted atomic layer deposition NiO nanofilms for improved hybrid solid state electrochromic device

AU - Kandpal, Suchita

AU - Ezhov, Ilya

AU - Tanwar, Manushree

AU - Nazarov, Denis

AU - Olkhovskii, Denis

AU - Filatov, Leonid

AU - Maximov, Maxim Yu.

AU - Kumar, Rajesh

PY - 2023/2/1

Y1 - 2023/2/1

N2 - Alternate methods for deposition of electrochromic metal oxide thin films need to be explored to obtain anoptimized one while designing solid state hybrid or all-inorganic electrochromic device. To continue this quest,electrochromic performance from a hybrid electrochromic device obtaining using plasma assisted atomic layerdeposition (ALD) grown nickel oxide (NiO) thin film and viologen has been studied. A few tens of nanometersthick films of NiO were deposited first on silicon to optimize the deposition parameters prior to depositing onFluorine-doped Tin Oxide (FTO)/glass substrates for fabricating the device. The structural and morphologicalproperties of as-prepared films were analyzed by scanning electron spectroscopy (SEM), x-ray diffraction (XRD),Raman spectroscopy and x-ray photo electron spectroscopy (XPS) techniques. Thereafter, a solid state organicinorganic hybrid electrochromic device was fabricated using Nickel oxide (NiO) and ethyl viologen (EV). Thedevice changes its color between transparent and blue states under the potential window of ±1.7 V while takingless than 2s for toggling between the two-colored states. The device also exhibits an impressive electrochromicbehavior with coloration efficiency of 118cm2/C, contrast ratio of 21% and a good cycle life/stability. The ALDgrown films appeared to have advantage over other methods as it yields an atomically smooth and crack-lessnano film so that proper power utilization take place for color switching. All these results open a new way tothe fabrication of inorganic component to fabricate high-performance hybrid solid state electrochromic devices.

AB - Alternate methods for deposition of electrochromic metal oxide thin films need to be explored to obtain anoptimized one while designing solid state hybrid or all-inorganic electrochromic device. To continue this quest,electrochromic performance from a hybrid electrochromic device obtaining using plasma assisted atomic layerdeposition (ALD) grown nickel oxide (NiO) thin film and viologen has been studied. A few tens of nanometersthick films of NiO were deposited first on silicon to optimize the deposition parameters prior to depositing onFluorine-doped Tin Oxide (FTO)/glass substrates for fabricating the device. The structural and morphologicalproperties of as-prepared films were analyzed by scanning electron spectroscopy (SEM), x-ray diffraction (XRD),Raman spectroscopy and x-ray photo electron spectroscopy (XPS) techniques. Thereafter, a solid state organicinorganic hybrid electrochromic device was fabricated using Nickel oxide (NiO) and ethyl viologen (EV). Thedevice changes its color between transparent and blue states under the potential window of ±1.7 V while takingless than 2s for toggling between the two-colored states. The device also exhibits an impressive electrochromicbehavior with coloration efficiency of 118cm2/C, contrast ratio of 21% and a good cycle life/stability. The ALDgrown films appeared to have advantage over other methods as it yields an atomically smooth and crack-lessnano film so that proper power utilization take place for color switching. All these results open a new way tothe fabrication of inorganic component to fabricate high-performance hybrid solid state electrochromic devices.

KW - Electrochromic device

KW - Atomic layer deposition

KW - Nickel oxide

KW - Viologen

U2 - 10.1016/j.optmat.2023.113494

DO - 10.1016/j.optmat.2023.113494

M3 - Article

VL - 136

JO - Optical Materials

JF - Optical Materials

SN - 0925-3467

M1 - 113494

ER -