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Oxygen Intercalation and Oxidation of Atomically Thin h-BN Grown on a Curved Ni Crystal. / Makarova, Anna A.; Fernandez, Laura; Usachov, Dmitry Yu; Fedorov, Alexander A.; Bokai, Kirill A.; Smirnov, Dmitry A.; Laubschat, Clemens; Vyalikh, Denis V.; Schiller, Frederik; Ortega, J. Enrique.

в: Journal of Physical Chemistry C, Том 123, № 1, 01.10.2019, стр. 593-602.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

Harvard

Makarova, AA, Fernandez, L, Usachov, DY, Fedorov, AA, Bokai, KA, Smirnov, DA, Laubschat, C, Vyalikh, DV, Schiller, F & Ortega, JE 2019, 'Oxygen Intercalation and Oxidation of Atomically Thin h-BN Grown on a Curved Ni Crystal', Journal of Physical Chemistry C, Том. 123, № 1, стр. 593-602. https://doi.org/10.1021/acs.jpcc.8b10574

APA

Makarova, A. A., Fernandez, L., Usachov, D. Y., Fedorov, A. A., Bokai, K. A., Smirnov, D. A., Laubschat, C., Vyalikh, D. V., Schiller, F., & Ortega, J. E. (2019). Oxygen Intercalation and Oxidation of Atomically Thin h-BN Grown on a Curved Ni Crystal. Journal of Physical Chemistry C, 123(1), 593-602. https://doi.org/10.1021/acs.jpcc.8b10574

Vancouver

Makarova AA, Fernandez L, Usachov DY, Fedorov AA, Bokai KA, Smirnov DA и пр. Oxygen Intercalation and Oxidation of Atomically Thin h-BN Grown on a Curved Ni Crystal. Journal of Physical Chemistry C. 2019 Окт. 1;123(1):593-602. https://doi.org/10.1021/acs.jpcc.8b10574

Author

Makarova, Anna A. ; Fernandez, Laura ; Usachov, Dmitry Yu ; Fedorov, Alexander A. ; Bokai, Kirill A. ; Smirnov, Dmitry A. ; Laubschat, Clemens ; Vyalikh, Denis V. ; Schiller, Frederik ; Ortega, J. Enrique. / Oxygen Intercalation and Oxidation of Atomically Thin h-BN Grown on a Curved Ni Crystal. в: Journal of Physical Chemistry C. 2019 ; Том 123, № 1. стр. 593-602.

BibTeX

@article{af4ec9d874fb4a69b8fb65ad5759b49b,
title = "Oxygen Intercalation and Oxidation of Atomically Thin h-BN Grown on a Curved Ni Crystal",
abstract = "We study the effect of thermal oxygen exposure on a monolayer of h-BN grown on vicinal Ni surfaces by scanning tunneling microscopy, X-ray absorption, and photoemission spectroscopies. Using a curved Ni crystal, we carry out a systematic exploration of the h-BN monolayer interfacing a full variety of vicinal orientations around the (111) high-symmetry direction. We demonstrate the occurrence of two processes upon oxygen exposure: oxygen intercalation underneath the h-BN layer, which leads to decoupling of the h-BN from the substrate, and oxidation of h-BN itself, which proceeds via substitution of nitrogen atoms. Oxygen intercalation appears to be substrate orientation dependent, while oxidation of h-BN is rather uniform over the different vicinal planes. These findings will be of importance for future applications of BN-based devices and materials under ambient conditions. {\textcopyright}",
keywords = "HEXAGONAL BORON-NITRIDE, CHEMICAL-VAPOR-DEPOSITION, MONOLAYER, GRAPHENE, NI(111), REDUCTION, SURFACE, FILMS",
author = "Makarova, {Anna A.} and Laura Fernandez and Usachov, {Dmitry Yu} and Fedorov, {Alexander A.} and Bokai, {Kirill A.} and Smirnov, {Dmitry A.} and Clemens Laubschat and Vyalikh, {Denis V.} and Frederik Schiller and Ortega, {J. Enrique}",
year = "2019",
month = oct,
day = "1",
doi = "10.1021/acs.jpcc.8b10574",
language = "English",
volume = "123",
pages = "593--602",
journal = "Journal of Physical Chemistry C",
issn = "1932-7447",
publisher = "American Chemical Society",
number = "1",

}

RIS

TY - JOUR

T1 - Oxygen Intercalation and Oxidation of Atomically Thin h-BN Grown on a Curved Ni Crystal

AU - Makarova, Anna A.

AU - Fernandez, Laura

AU - Usachov, Dmitry Yu

AU - Fedorov, Alexander A.

AU - Bokai, Kirill A.

AU - Smirnov, Dmitry A.

AU - Laubschat, Clemens

AU - Vyalikh, Denis V.

AU - Schiller, Frederik

AU - Ortega, J. Enrique

PY - 2019/10/1

Y1 - 2019/10/1

N2 - We study the effect of thermal oxygen exposure on a monolayer of h-BN grown on vicinal Ni surfaces by scanning tunneling microscopy, X-ray absorption, and photoemission spectroscopies. Using a curved Ni crystal, we carry out a systematic exploration of the h-BN monolayer interfacing a full variety of vicinal orientations around the (111) high-symmetry direction. We demonstrate the occurrence of two processes upon oxygen exposure: oxygen intercalation underneath the h-BN layer, which leads to decoupling of the h-BN from the substrate, and oxidation of h-BN itself, which proceeds via substitution of nitrogen atoms. Oxygen intercalation appears to be substrate orientation dependent, while oxidation of h-BN is rather uniform over the different vicinal planes. These findings will be of importance for future applications of BN-based devices and materials under ambient conditions. ©

AB - We study the effect of thermal oxygen exposure on a monolayer of h-BN grown on vicinal Ni surfaces by scanning tunneling microscopy, X-ray absorption, and photoemission spectroscopies. Using a curved Ni crystal, we carry out a systematic exploration of the h-BN monolayer interfacing a full variety of vicinal orientations around the (111) high-symmetry direction. We demonstrate the occurrence of two processes upon oxygen exposure: oxygen intercalation underneath the h-BN layer, which leads to decoupling of the h-BN from the substrate, and oxidation of h-BN itself, which proceeds via substitution of nitrogen atoms. Oxygen intercalation appears to be substrate orientation dependent, while oxidation of h-BN is rather uniform over the different vicinal planes. These findings will be of importance for future applications of BN-based devices and materials under ambient conditions. ©

KW - HEXAGONAL BORON-NITRIDE

KW - CHEMICAL-VAPOR-DEPOSITION

KW - MONOLAYER

KW - GRAPHENE

KW - NI(111)

KW - REDUCTION

KW - SURFACE

KW - FILMS

UR - http://www.scopus.com/inward/record.url?scp=85059883139&partnerID=8YFLogxK

UR - http://www.mendeley.com/research/oxygen-intercalation-oxidation-atomically-thin-hbn-grown-curved-ni-crystal

U2 - 10.1021/acs.jpcc.8b10574

DO - 10.1021/acs.jpcc.8b10574

M3 - Article

AN - SCOPUS:85059883139

VL - 123

SP - 593

EP - 602

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

SN - 1932-7447

IS - 1

ER -

ID: 38759966