Nanofabrication by means of selective chemical etching enhanced by irradiation with a focused helium ion beam

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Nanofabrication by means of selective chemical etching enhanced by irradiation with a focused helium ion beam. / Grigoryev, E. A. ; Petrov, Yu. V. ; Baraban, A. P. .

2020. Реферат от CMD 2020 GEFES.

Результаты исследований: Материалы конференций › тезисы

BibTeX

@conference{51cabe5300c147969a050f9570b86964,

title = "Nanofabrication by means of selective chemical etching enhanced by irradiation with a focused helium ion beam",

author = "Grigoryev, {E. A.} and Petrov, {Yu. V.} and Baraban, {A. P.}",

note = "2020 Joint Conference of the Condensed Matter Divisions of EPS (CMD) and RSEF (GEFES). Focused Ion Beam Induced Processing; CMD 2020 GEFES ; Conference date: 31-08-2020 Through 04-09-2020",

year = "2020",

month = sep,

language = "English",

url = "https://www.cmd2020gefes.eu/28512/detail/2020-joint-conference-of-the-condensed-matter-divisions-of-eps-cmd-and-rsef-gefes.html",

}

RIS

TY - CONF

T1 - Nanofabrication by means of selective chemical etching enhanced by irradiation with a focused helium ion beam

AU - Grigoryev, E. A.

AU - Petrov, Yu. V.

AU - Baraban, A. P.

N1 - 2020 Joint Conference of the Condensed Matter Divisions of EPS (CMD) and RSEF (GEFES). Focused Ion Beam Induced Processing

PY - 2020/9

Y1 - 2020/9

M3 - Abstract

T2 - CMD 2020 GEFES

Y2 - 31 August 2020 through 4 September 2020

ER -

ID: 71919491