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Molecular-dynamic investigation of the process of cluster interaction with the substrate surface in the course of molecular beam epitaxy. / Makhviladze, T. M.; Paukshto, M. V.; Leora, S. N.

в: Surface Investigation X-Ray, Synchrotron and Neutron Techniques, Том 14, № 3, 01.12.1998, стр. 345-352.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

Harvard

Makhviladze, TM, Paukshto, MV & Leora, SN 1998, 'Molecular-dynamic investigation of the process of cluster interaction with the substrate surface in the course of molecular beam epitaxy', Surface Investigation X-Ray, Synchrotron and Neutron Techniques, Том. 14, № 3, стр. 345-352.

APA

Makhviladze, T. M., Paukshto, M. V., & Leora, S. N. (1998). Molecular-dynamic investigation of the process of cluster interaction with the substrate surface in the course of molecular beam epitaxy. Surface Investigation X-Ray, Synchrotron and Neutron Techniques, 14(3), 345-352.

Vancouver

Makhviladze TM, Paukshto MV, Leora SN. Molecular-dynamic investigation of the process of cluster interaction with the substrate surface in the course of molecular beam epitaxy. Surface Investigation X-Ray, Synchrotron and Neutron Techniques. 1998 Дек. 1;14(3):345-352.

Author

Makhviladze, T. M. ; Paukshto, M. V. ; Leora, S. N. / Molecular-dynamic investigation of the process of cluster interaction with the substrate surface in the course of molecular beam epitaxy. в: Surface Investigation X-Ray, Synchrotron and Neutron Techniques. 1998 ; Том 14, № 3. стр. 345-352.

BibTeX

@article{74a43abc7172465b996c57e83c7d3bf2,
title = "Molecular-dynamic investigation of the process of cluster interaction with the substrate surface in the course of molecular beam epitaxy",
abstract = "The interaction of Al4 clusters with a GaAs (001) crystalline substrate has been studied using the method of molecular dynamics. Some physical characteristics describing the surface diffusion process (coefficients of diffusion, adhesion and others) are computed as functions of the substrate temperature, magnitude and direction of the cluster speed vector.",
author = "Makhviladze, {T. M.} and Paukshto, {M. V.} and Leora, {S. N.}",
year = "1998",
month = dec,
day = "1",
language = "English",
volume = "14",
pages = "345--352",
journal = "ПОВЕРХНОСТЬ. РЕНТГЕНОВСКИЕ, СИНХРОТРОННЫЕ И НЕЙТРОННЫЕ ИССЛЕДОВАНИЯ",
issn = "1027-4510",
publisher = "МАИК {"}Наука/Интерпериодика{"}",
number = "3",

}

RIS

TY - JOUR

T1 - Molecular-dynamic investigation of the process of cluster interaction with the substrate surface in the course of molecular beam epitaxy

AU - Makhviladze, T. M.

AU - Paukshto, M. V.

AU - Leora, S. N.

PY - 1998/12/1

Y1 - 1998/12/1

N2 - The interaction of Al4 clusters with a GaAs (001) crystalline substrate has been studied using the method of molecular dynamics. Some physical characteristics describing the surface diffusion process (coefficients of diffusion, adhesion and others) are computed as functions of the substrate temperature, magnitude and direction of the cluster speed vector.

AB - The interaction of Al4 clusters with a GaAs (001) crystalline substrate has been studied using the method of molecular dynamics. Some physical characteristics describing the surface diffusion process (coefficients of diffusion, adhesion and others) are computed as functions of the substrate temperature, magnitude and direction of the cluster speed vector.

UR - http://www.scopus.com/inward/record.url?scp=0032291402&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0032291402

VL - 14

SP - 345

EP - 352

JO - ПОВЕРХНОСТЬ. РЕНТГЕНОВСКИЕ, СИНХРОТРОННЫЕ И НЕЙТРОННЫЕ ИССЛЕДОВАНИЯ

JF - ПОВЕРХНОСТЬ. РЕНТГЕНОВСКИЕ, СИНХРОТРОННЫЕ И НЕЙТРОННЫЕ ИССЛЕДОВАНИЯ

SN - 1027-4510

IS - 3

ER -

ID: 36981279