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Modeling of small clusters : A new approach to processes of chemical vapor deposition. / Timoshkin, A. Yu.

в: Russian Journal of Physical Chemistry A, Том 74, № 2, 2000, стр. 312-318.

Результаты исследований: Научные публикации в периодических изданияхстатьяРецензирование

Harvard

Timoshkin, AY 2000, 'Modeling of small clusters: A new approach to processes of chemical vapor deposition', Russian Journal of Physical Chemistry A, Том. 74, № 2, стр. 312-318.

APA

Timoshkin, A. Y. (2000). Modeling of small clusters: A new approach to processes of chemical vapor deposition. Russian Journal of Physical Chemistry A, 74(2), 312-318.

Vancouver

Timoshkin AY. Modeling of small clusters: A new approach to processes of chemical vapor deposition. Russian Journal of Physical Chemistry A. 2000;74(2):312-318.

Author

Timoshkin, A. Yu. / Modeling of small clusters : A new approach to processes of chemical vapor deposition. в: Russian Journal of Physical Chemistry A. 2000 ; Том 74, № 2. стр. 312-318.

BibTeX

@article{c79650b8b31847a2aa1a5d428ce5e989,
title = "Modeling of small clusters: A new approach to processes of chemical vapor deposition",
abstract = "The B3LYP/DZP density functional method was used to calculate the structural, spectral, and thermodynamic characteristics of the R3GaNR′3 donor-acceptor complexes and of the products of their dissociation (GaRx and NR′x) and association ([R2GaNR′2]x and [RGaNR′]x) (R, R′ = H, CH3; x = 1-3). It was shown that the elimination of RR′ followed by association in the gas phase is the thermodynamically most favorable process over the temperature range from 500 to 1000 K. This suggests that high-temperature association processes in vapors play the main role in the chemical vapor deposition of binary nitrides from the gas phase. A mechanism of the contamination of the nitrides with carbon that postulates the migration of the CH2 group with the formation of Ga, N, C-containing rings stable in the gas phase was proposed.",
author = "Timoshkin, {A. Yu}",
year = "2000",
language = "English",
volume = "74",
pages = "312--318",
journal = "Russian Journal of Physical Chemistry A",
issn = "0036-0244",
publisher = "МАИК {"}Наука/Интерпериодика{"}",
number = "2",

}

RIS

TY - JOUR

T1 - Modeling of small clusters

T2 - A new approach to processes of chemical vapor deposition

AU - Timoshkin, A. Yu

PY - 2000

Y1 - 2000

N2 - The B3LYP/DZP density functional method was used to calculate the structural, spectral, and thermodynamic characteristics of the R3GaNR′3 donor-acceptor complexes and of the products of their dissociation (GaRx and NR′x) and association ([R2GaNR′2]x and [RGaNR′]x) (R, R′ = H, CH3; x = 1-3). It was shown that the elimination of RR′ followed by association in the gas phase is the thermodynamically most favorable process over the temperature range from 500 to 1000 K. This suggests that high-temperature association processes in vapors play the main role in the chemical vapor deposition of binary nitrides from the gas phase. A mechanism of the contamination of the nitrides with carbon that postulates the migration of the CH2 group with the formation of Ga, N, C-containing rings stable in the gas phase was proposed.

AB - The B3LYP/DZP density functional method was used to calculate the structural, spectral, and thermodynamic characteristics of the R3GaNR′3 donor-acceptor complexes and of the products of their dissociation (GaRx and NR′x) and association ([R2GaNR′2]x and [RGaNR′]x) (R, R′ = H, CH3; x = 1-3). It was shown that the elimination of RR′ followed by association in the gas phase is the thermodynamically most favorable process over the temperature range from 500 to 1000 K. This suggests that high-temperature association processes in vapors play the main role in the chemical vapor deposition of binary nitrides from the gas phase. A mechanism of the contamination of the nitrides with carbon that postulates the migration of the CH2 group with the formation of Ga, N, C-containing rings stable in the gas phase was proposed.

UR - http://www.scopus.com/inward/record.url?scp=0034389881&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0033809590

VL - 74

SP - 312

EP - 318

JO - Russian Journal of Physical Chemistry A

JF - Russian Journal of Physical Chemistry A

SN - 0036-0244

IS - 2

ER -

ID: 17371409