Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Interface formation between Be and W layers depending on its thickness and ordering. / Sakhonenkov, Sergei S.; Filatova, Elena O.
в: Applied Surface Science, Том 534, 147636, 30.12.2020, стр. 147636.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Interface formation between Be and W layers depending on its thickness and ordering
AU - Sakhonenkov, Sergei S.
AU - Filatova, Elena O.
N1 - Publisher Copyright: © 2020 Elsevier B.V.
PY - 2020/12/30
Y1 - 2020/12/30
N2 - In the present work, formation of interfaces in the W/Be layered structures was studied using X-ray photoelectron spectroscopy. Chemical composition and significance of the interfaces depending on the thickness and ordering of beryllium and tungsten layers were investigated by means of the XPS spectra decomposition technique. The formation of tungsten beryllides WBe2 and WBe12 at the W-on-Be and Be-on-W interfaces, respectively, was revealed. The thickness of WBe2 beryllide does not depend on the thickness of a tungsten top layer, whereas WBe12 thickness increases with increasing Be top layer thickness. Additionally, oxidation of a Be layer under a thin W layer was established and possible mechanism underlying this process was proposed.
AB - In the present work, formation of interfaces in the W/Be layered structures was studied using X-ray photoelectron spectroscopy. Chemical composition and significance of the interfaces depending on the thickness and ordering of beryllium and tungsten layers were investigated by means of the XPS spectra decomposition technique. The formation of tungsten beryllides WBe2 and WBe12 at the W-on-Be and Be-on-W interfaces, respectively, was revealed. The thickness of WBe2 beryllide does not depend on the thickness of a tungsten top layer, whereas WBe12 thickness increases with increasing Be top layer thickness. Additionally, oxidation of a Be layer under a thin W layer was established and possible mechanism underlying this process was proposed.
KW - Keywords: X-ray photoelectron spectroscopy Peak fitting Thin films Chemical states Be/W and W/Be oxidation mechanisms
KW - X-ray photoelectron spectroscopy
KW - Peak fitting
KW - Thin films
KW - Chemical states
KW - Be/W and W/Be oxidation mechanisms
KW - MULTILAYER MIRRORS
KW - STABILITY
KW - BERYLLIUM-OXIDE
KW - FILMS
KW - X-RAY
KW - TUNGSTEN
KW - XPS
KW - RANGE
UR - https://www.sciencedirect.com/science/article/abs/pii/S016943322032393X
UR - http://www.scopus.com/inward/record.url?scp=85089937838&partnerID=8YFLogxK
UR - https://www.mendeley.com/catalogue/4eec9430-8964-36ff-8644-b774d65b0215/
U2 - doi.org/10.1016/j.apsusc.2020.147636
DO - doi.org/10.1016/j.apsusc.2020.147636
M3 - Article
VL - 534
SP - 147636
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
M1 - 147636
ER -
ID: 61630758