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Influence of the level of the low-voltage conduction on the structure of the through electrohydrodynamic flow in a symmetric electrode system. / Ashikhmin, I.A.; Stishkov, Y.K.

в: Surface Engineering and Applied Electrochemistry, Том 50, № 3, 2014, стр. 246-252.

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Ashikhmin, I.A. ; Stishkov, Y.K. / Influence of the level of the low-voltage conduction on the structure of the through electrohydrodynamic flow in a symmetric electrode system. в: Surface Engineering and Applied Electrochemistry. 2014 ; Том 50, № 3. стр. 246-252.

BibTeX

@article{eaf8fd17e1234577b7652eaf469731c6,
title = "Influence of the level of the low-voltage conduction on the structure of the through electrohydrodynamic flow in a symmetric electrode system",
abstract = "This paper presents the results of the numerical simulation of the through electrohydrodynamic (EHD) flow in a symmetric system of electrodes placed in a channel with dielectric walls and filled with a liquid dielectric. Based on this model, we study the changes in the structure of the through flow at different levels of the low-voltage conduction of the dielectric fluid. The analysis of the solutions shows that the flow structure with conductivities up to 10-11 S/m hardly differs from the case of the zero conduction. The recombination of the charge grows at the larger values of the low-voltage conduction in the near-electrode layers, resulting in the lower penetration of the injected charge into the bulk and reorganization of the kinematics of the arising EHD through flow, which is reflected in a shift of the acceleration zone towards the active electrode. {\textcopyright} 2014 Allerton Press, Inc.",
author = "I.A. Ashikhmin and Y.K. Stishkov",
year = "2014",
doi = "10.3103/S1068375514030028",
language = "English",
volume = "50",
pages = "246--252",
journal = "Surface Engineering and Applied Electrochemistry",
issn = "1068-3755",
publisher = "Allerton Press, Inc.",
number = "3",

}

RIS

TY - JOUR

T1 - Influence of the level of the low-voltage conduction on the structure of the through electrohydrodynamic flow in a symmetric electrode system

AU - Ashikhmin, I.A.

AU - Stishkov, Y.K.

PY - 2014

Y1 - 2014

N2 - This paper presents the results of the numerical simulation of the through electrohydrodynamic (EHD) flow in a symmetric system of electrodes placed in a channel with dielectric walls and filled with a liquid dielectric. Based on this model, we study the changes in the structure of the through flow at different levels of the low-voltage conduction of the dielectric fluid. The analysis of the solutions shows that the flow structure with conductivities up to 10-11 S/m hardly differs from the case of the zero conduction. The recombination of the charge grows at the larger values of the low-voltage conduction in the near-electrode layers, resulting in the lower penetration of the injected charge into the bulk and reorganization of the kinematics of the arising EHD through flow, which is reflected in a shift of the acceleration zone towards the active electrode. © 2014 Allerton Press, Inc.

AB - This paper presents the results of the numerical simulation of the through electrohydrodynamic (EHD) flow in a symmetric system of electrodes placed in a channel with dielectric walls and filled with a liquid dielectric. Based on this model, we study the changes in the structure of the through flow at different levels of the low-voltage conduction of the dielectric fluid. The analysis of the solutions shows that the flow structure with conductivities up to 10-11 S/m hardly differs from the case of the zero conduction. The recombination of the charge grows at the larger values of the low-voltage conduction in the near-electrode layers, resulting in the lower penetration of the injected charge into the bulk and reorganization of the kinematics of the arising EHD through flow, which is reflected in a shift of the acceleration zone towards the active electrode. © 2014 Allerton Press, Inc.

U2 - 10.3103/S1068375514030028

DO - 10.3103/S1068375514030028

M3 - Article

VL - 50

SP - 246

EP - 252

JO - Surface Engineering and Applied Electrochemistry

JF - Surface Engineering and Applied Electrochemistry

SN - 1068-3755

IS - 3

ER -

ID: 7035517