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Influence of the inaccuracy of the plasma potential on the shape of the electron distribution function obtained from the probe characteristic. / Golubovskii, Yu.B.; Kozakov, R.V.; Nekuchaev, V.O.; Sheykin, I.E.; Skoblo, A.Yu.

в: Plasma Sources Science and Technology, Том 19, № 4, 2010, стр. 045019_1-11.

Результаты исследований: Научные публикации в периодических изданияхстатья

Harvard

Golubovskii, YB, Kozakov, RV, Nekuchaev, VO, Sheykin, IE & Skoblo, AY 2010, 'Influence of the inaccuracy of the plasma potential on the shape of the electron distribution function obtained from the probe characteristic.', Plasma Sources Science and Technology, Том. 19, № 4, стр. 045019_1-11. https://doi.org/doi:10.1088/0963-0252/19/4/045019

APA

Vancouver

Author

Golubovskii, Yu.B. ; Kozakov, R.V. ; Nekuchaev, V.O. ; Sheykin, I.E. ; Skoblo, A.Yu. / Influence of the inaccuracy of the plasma potential on the shape of the electron distribution function obtained from the probe characteristic. в: Plasma Sources Science and Technology. 2010 ; Том 19, № 4. стр. 045019_1-11.

BibTeX

@article{9f9be4e25d9b4dc895f7d419dc736404,
title = "Influence of the inaccuracy of the plasma potential on the shape of the electron distribution function obtained from the probe characteristic.",
author = "Yu.B. Golubovskii and R.V. Kozakov and V.O. Nekuchaev and I.E. Sheykin and A.Yu. Skoblo",
year = "2010",
doi = "doi:10.1088/0963-0252/19/4/045019",
language = "English",
volume = "19",
pages = "045019_1--11",
journal = "Plasma Sources Science and Technology",
issn = "0963-0252",
publisher = "IOP Publishing Ltd.",
number = "4",

}

RIS

TY - JOUR

T1 - Influence of the inaccuracy of the plasma potential on the shape of the electron distribution function obtained from the probe characteristic.

AU - Golubovskii, Yu.B.

AU - Kozakov, R.V.

AU - Nekuchaev, V.O.

AU - Sheykin, I.E.

AU - Skoblo, A.Yu.

PY - 2010

Y1 - 2010

U2 - doi:10.1088/0963-0252/19/4/045019

DO - doi:10.1088/0963-0252/19/4/045019

M3 - Article

VL - 19

SP - 045019_1-11

JO - Plasma Sources Science and Technology

JF - Plasma Sources Science and Technology

SN - 0963-0252

IS - 4

ER -

ID: 5187951