Результаты исследований: Публикации в книгах, отчётах, сборниках, трудах конференций › статья в сборнике материалов конференции › научная › Рецензирование
Influence of Plasma and Electron Beam Noise on System Instability at Knudsen Numbers of the Order of 1. / Sukhomlinov, V.; Zaitsev, A.; Timofeev, N.; Mustafaev, A.
2021 IEEE International Conference on Plasma Science, ICOPS 2021. Institute of Electrical and Electronics Engineers Inc., 2021. (IEEE International Conference on Plasma Science; Том 2021-September).Результаты исследований: Публикации в книгах, отчётах, сборниках, трудах конференций › статья в сборнике материалов конференции › научная › Рецензирование
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TY - GEN
T1 - Influence of Plasma and Electron Beam Noise on System Instability at Knudsen Numbers of the Order of 1
AU - Sukhomlinov, V.
AU - Zaitsev, A.
AU - Timofeev, N.
AU - Mustafaev, A.
N1 - Conference code: 48
PY - 2021/9/12
Y1 - 2021/9/12
N2 - The work is devoted to the development of the kinetic theory of stability of the fast electron beam - gas-discharge plasma system taking into account the beam and plasma noise, which is important for optical radiation sources based on beam discharges, for example, a hollow cathode. It is shown that in this case the problem is of a mixed nature. Namely, when the shot noise of the beam and the intrinsic noise of the plasma are taken into account, stability problems arise with boundary conditions and initial conditions, respectively.
AB - The work is devoted to the development of the kinetic theory of stability of the fast electron beam - gas-discharge plasma system taking into account the beam and plasma noise, which is important for optical radiation sources based on beam discharges, for example, a hollow cathode. It is shown that in this case the problem is of a mixed nature. Namely, when the shot noise of the beam and the intrinsic noise of the plasma are taken into account, stability problems arise with boundary conditions and initial conditions, respectively.
UR - http://www.scopus.com/inward/record.url?scp=85119605401&partnerID=8YFLogxK
UR - https://www.mendeley.com/catalogue/108ca288-0b09-38c1-acd4-a9f10084f1f7/
U2 - 10.1109/icops36761.2021.9588469
DO - 10.1109/icops36761.2021.9588469
M3 - Conference contribution
AN - SCOPUS:85119605401
SN - 9781665432276
T3 - IEEE International Conference on Plasma Science
BT - 2021 IEEE International Conference on Plasma Science, ICOPS 2021
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2021 IEEE International Conference on Plasma Science, ICOPS 2021
Y2 - 12 September 2021 through 16 September 2021
ER -
ID: 89535486