Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Influence of an additional ballast volume on a pulsed ICP discharge. / Bogdanov, E. A.; DeJoseph, C. A.; Demidov, V. I.; Kudryavtsev, A. A.; Serditov, K. Yu.
в: Plasma Sources Science and Technology, Том 16, № 4, 01.12.2007, стр. 697-702.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Influence of an additional ballast volume on a pulsed ICP discharge
AU - Bogdanov, E. A.
AU - DeJoseph, C. A.
AU - Demidov, V. I.
AU - Kudryavtsev, A. A.
AU - Serditov, K. Yu
PY - 2007/12/1
Y1 - 2007/12/1
N2 - A spatial and temporal numerical simulation has been carried out of a pulsed (100% modulated), rf inductively coupled plasma discharge in argon, connected to an additional (ballast) diffusion chamber of much larger volume. It is demonstrated that during the active phase, the presence of the large ballast volume has a small impact on the parameters of the plasma in the smaller discharge chamber. In this case the plasma parameters in the discharge chamber can be estimated separately from the diffusion chamber by a standard method using the characteristic ambipolar diffusion time (for example, using a global model). However, during the afterglow phase, the situation is changed significantly. In the afterglow, the densities of charged particles in the discharge chamber become lower than in the large ballast chamber due to more rapid diffusion loss. As a result, the reverse of the active phase situation occurs, namely, the plasma does not flow from the small to the large chamber, but in the opposite direction, from diffusive to discharge volume, and both the plasma density gradient and the self-consistent ambipolar electric field in the small chamber change directions. This phenomenon leads to new effects in the discharge volume, in particular a decreasing rate of decay of densities of charged particles and electron temperature. Thus, in the afterglow the presence of a large additional ballast volume has a significant impact on the plasma transport. In this case, a simple treatment of the plasma in the discharge chamber in the framework of a spatially averaged model (for example, the global model) is inadequate.
AB - A spatial and temporal numerical simulation has been carried out of a pulsed (100% modulated), rf inductively coupled plasma discharge in argon, connected to an additional (ballast) diffusion chamber of much larger volume. It is demonstrated that during the active phase, the presence of the large ballast volume has a small impact on the parameters of the plasma in the smaller discharge chamber. In this case the plasma parameters in the discharge chamber can be estimated separately from the diffusion chamber by a standard method using the characteristic ambipolar diffusion time (for example, using a global model). However, during the afterglow phase, the situation is changed significantly. In the afterglow, the densities of charged particles in the discharge chamber become lower than in the large ballast chamber due to more rapid diffusion loss. As a result, the reverse of the active phase situation occurs, namely, the plasma does not flow from the small to the large chamber, but in the opposite direction, from diffusive to discharge volume, and both the plasma density gradient and the self-consistent ambipolar electric field in the small chamber change directions. This phenomenon leads to new effects in the discharge volume, in particular a decreasing rate of decay of densities of charged particles and electron temperature. Thus, in the afterglow the presence of a large additional ballast volume has a significant impact on the plasma transport. In this case, a simple treatment of the plasma in the discharge chamber in the framework of a spatially averaged model (for example, the global model) is inadequate.
UR - http://www.scopus.com/inward/record.url?scp=34948894254&partnerID=8YFLogxK
U2 - 10.1088/0963-0252/16/4/002
DO - 10.1088/0963-0252/16/4/002
M3 - Article
AN - SCOPUS:34948894254
VL - 16
SP - 697
EP - 702
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
SN - 0963-0252
IS - 4
ER -
ID: 42901287