Generation of high-quality GeV-class electron beams utilizing attosecond ionization injection

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Generation of high-quality GeV-class electron beams utilizing attosecond ionization injection. / Lecz, Zsolt; Andreev, Alexander; Kamperidis, Christos; Hafz, Nasr.

в: New Journal of Physics, Том 23, № 4, 043016, 04.2021.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

BibTeX

@article{77d5547fe82c4032a8f6409f98534085,

title = "Generation of high-quality GeV-class electron beams utilizing attosecond ionization injection",

abstract = "Acceleration of electrons in laser-driven plasma wakefields has been extended up to the 10 GeV energy within a distance of 10s of centimeters. However, in applications, requiring small energy spread within the electron bunch, only a small portion of the bunch can be used and often the low-energy electrons represent undesired background in the spectrum. We present a compact and tunable scheme providing clean and mono-energetic electron bunches with less than one percent energy spread and with central energy on the GeV level. It is a two-step process consisting of ionization injection with attosecond pulses and acceleration in a capillary plasma wave-guide. Semi-analytical theory and particle-in-cell simulations are used to accurately model the injection and acceleration steps. ",

keywords = "ionization injection, laser wakefield acceleration, laser wave-guide, low emittance, mono-energetic electron beam, relativisitc electron beam",

author = "Zsolt Lecz and Alexander Andreev and Christos Kamperidis and Nasr Hafz",

note = "Publisher Copyright: {\textcopyright} 2021 The Author(s). Published by IOP Publishing Ltd on behalf of the Institute of Physics and Deutsche Physikalische Gesellschaft.",

year = "2021",

month = apr,

doi = "10.1088/1367-2630/abf076",

language = "English",

volume = "23",

journal = "New Journal of Physics",

issn = "1367-2630",

publisher = "IOP Publishing Ltd.",

number = "4",

}

RIS

TY - JOUR

T1 - Generation of high-quality GeV-class electron beams utilizing attosecond ionization injection

AU - Lecz, Zsolt

AU - Andreev, Alexander

AU - Kamperidis, Christos

AU - Hafz, Nasr

PY - 2021/4

Y1 - 2021/4

N2 - Acceleration of electrons in laser-driven plasma wakefields has been extended up to the 10 GeV energy within a distance of 10s of centimeters. However, in applications, requiring small energy spread within the electron bunch, only a small portion of the bunch can be used and often the low-energy electrons represent undesired background in the spectrum. We present a compact and tunable scheme providing clean and mono-energetic electron bunches with less than one percent energy spread and with central energy on the GeV level. It is a two-step process consisting of ionization injection with attosecond pulses and acceleration in a capillary plasma wave-guide. Semi-analytical theory and particle-in-cell simulations are used to accurately model the injection and acceleration steps.

AB - Acceleration of electrons in laser-driven plasma wakefields has been extended up to the 10 GeV energy within a distance of 10s of centimeters. However, in applications, requiring small energy spread within the electron bunch, only a small portion of the bunch can be used and often the low-energy electrons represent undesired background in the spectrum. We present a compact and tunable scheme providing clean and mono-energetic electron bunches with less than one percent energy spread and with central energy on the GeV level. It is a two-step process consisting of ionization injection with attosecond pulses and acceleration in a capillary plasma wave-guide. Semi-analytical theory and particle-in-cell simulations are used to accurately model the injection and acceleration steps.

KW - ionization injection

KW - laser wakefield acceleration

KW - laser wave-guide

KW - low emittance

KW - mono-energetic electron beam

KW - relativisitc electron beam

UR - http://www.scopus.com/inward/record.url?scp=85104567144&partnerID=8YFLogxK

UR - https://www.mendeley.com/catalogue/80948270-982c-39a4-95db-b2667c6f4843/

U2 - 10.1088/1367-2630/abf076

DO - 10.1088/1367-2630/abf076

M3 - Article

AN - SCOPUS:85104567144

VL - 23

JO - New Journal of Physics

JF - New Journal of Physics

SN - 1367-2630

IS - 4

M1 - 043016

ER -

ID: 85657649