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From "parasitic" association reactions toward the stoichiometry controlled gas phase synthesis of nanoparticles : A theoretically driven challenge for experimentalists. / Timoshkin, Alexey Y.; Schaefer, Henry F.

в: Chemical Record, Том 2, № 5, 01.09.2002, стр. 319-338.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

Harvard

Timoshkin, AY & Schaefer, HF 2002, 'From "parasitic" association reactions toward the stoichiometry controlled gas phase synthesis of nanoparticles: A theoretically driven challenge for experimentalists', Chemical Record, Том. 2, № 5, стр. 319-338. https://doi.org/10.1002/tcr.10037

APA

Timoshkin, A. Y., & Schaefer, H. F. (2002). From "parasitic" association reactions toward the stoichiometry controlled gas phase synthesis of nanoparticles: A theoretically driven challenge for experimentalists. Chemical Record, 2(5), 319-338. https://doi.org/10.1002/tcr.10037

Vancouver

Timoshkin AY, Schaefer HF. From "parasitic" association reactions toward the stoichiometry controlled gas phase synthesis of nanoparticles: A theoretically driven challenge for experimentalists. Chemical Record. 2002 Сент. 1;2(5):319-338. https://doi.org/10.1002/tcr.10037

Author

Timoshkin, Alexey Y. ; Schaefer, Henry F. / From "parasitic" association reactions toward the stoichiometry controlled gas phase synthesis of nanoparticles : A theoretically driven challenge for experimentalists. в: Chemical Record. 2002 ; Том 2, № 5. стр. 319-338.

BibTeX

@article{2b3a8f7beacc4aae9ad6e2332499eea3,
title = "From {"}parasitic{"} association reactions toward the stoichiometry controlled gas phase synthesis of nanoparticles: A theoretically driven challenge for experimentalists",
abstract = "In the present record a model for the gas-phase reactions during the chemical vapor deposition (CVD) processes of group 13-15 materials is presented, based on the results of extensive quantum-chemical modeling. Thermodynamic criteria have been introduced to evaluate the importance of a range of association reactions. For the organometallic and hydride derivatives, association processes are found to be favorable both thermodynamically and kinetically. Formation of high mass association products takes place under CVD conditions, including laser-assisted CVD. Structural and thermodynamic properties of the most important ring and cluster intermediates have been predicted. The stoichiometry-controlled synthesis of the 13-15 ternary alloys and nanoparticles using cluster compounds as single-source precursors is predicted to be viable. The association pathway described may be generalized to the CVD reactions of many binary materials (12-16, 13-16, 13-15, 14-15, 14-16).",
keywords = "Chemical vapor deposition (CVD), Gas phase association reactions, Gas phase thermochemistry, Modeling, Nanoparticles, Quantum chemistry, Ring and cluster compounds, Single-source precursors",
author = "Timoshkin, {Alexey Y.} and Schaefer, {Henry F.}",
year = "2002",
month = sep,
day = "1",
doi = "10.1002/tcr.10037",
language = "English",
volume = "2",
pages = "319--338",
journal = "Chemical Record",
issn = "1527-8999",
publisher = "Wiley-Blackwell",
number = "5",

}

RIS

TY - JOUR

T1 - From "parasitic" association reactions toward the stoichiometry controlled gas phase synthesis of nanoparticles

T2 - A theoretically driven challenge for experimentalists

AU - Timoshkin, Alexey Y.

AU - Schaefer, Henry F.

PY - 2002/9/1

Y1 - 2002/9/1

N2 - In the present record a model for the gas-phase reactions during the chemical vapor deposition (CVD) processes of group 13-15 materials is presented, based on the results of extensive quantum-chemical modeling. Thermodynamic criteria have been introduced to evaluate the importance of a range of association reactions. For the organometallic and hydride derivatives, association processes are found to be favorable both thermodynamically and kinetically. Formation of high mass association products takes place under CVD conditions, including laser-assisted CVD. Structural and thermodynamic properties of the most important ring and cluster intermediates have been predicted. The stoichiometry-controlled synthesis of the 13-15 ternary alloys and nanoparticles using cluster compounds as single-source precursors is predicted to be viable. The association pathway described may be generalized to the CVD reactions of many binary materials (12-16, 13-16, 13-15, 14-15, 14-16).

AB - In the present record a model for the gas-phase reactions during the chemical vapor deposition (CVD) processes of group 13-15 materials is presented, based on the results of extensive quantum-chemical modeling. Thermodynamic criteria have been introduced to evaluate the importance of a range of association reactions. For the organometallic and hydride derivatives, association processes are found to be favorable both thermodynamically and kinetically. Formation of high mass association products takes place under CVD conditions, including laser-assisted CVD. Structural and thermodynamic properties of the most important ring and cluster intermediates have been predicted. The stoichiometry-controlled synthesis of the 13-15 ternary alloys and nanoparticles using cluster compounds as single-source precursors is predicted to be viable. The association pathway described may be generalized to the CVD reactions of many binary materials (12-16, 13-16, 13-15, 14-15, 14-16).

KW - Chemical vapor deposition (CVD)

KW - Gas phase association reactions

KW - Gas phase thermochemistry

KW - Modeling

KW - Nanoparticles

KW - Quantum chemistry

KW - Ring and cluster compounds

KW - Single-source precursors

UR - http://www.scopus.com/inward/record.url?scp=0042022757&partnerID=8YFLogxK

U2 - 10.1002/tcr.10037

DO - 10.1002/tcr.10037

M3 - Article

C2 - 12369056

AN - SCOPUS:0042022757

VL - 2

SP - 319

EP - 338

JO - Chemical Record

JF - Chemical Record

SN - 1527-8999

IS - 5

ER -

ID: 36024109