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Electron stochastic heating in a capacitively coupled low-pressure argon rf-discharge. / Tatanova, M.; Golubovskii, Yu.B.; Smirnov, A.S.; Seimer, G.; Basner, R.; Kersten, H.
в:
Plasma Sources Science and Technology, Том 18, № 2, 2009, стр. 025026_1-6.
Результаты исследований: Научные публикации в периодических изданиях › статья
Harvard
Tatanova, M
, Golubovskii, YB, Smirnov, AS, Seimer, G, Basner, R & Kersten, H 2009, '
Electron stochastic heating in a capacitively coupled low-pressure argon rf-discharge.',
Plasma Sources Science and Technology, Том. 18, № 2, стр. 025026_1-6.
https://doi.org/DOI: 10.1088/0963-0252/18/2/025026APA
Tatanova, M.
, Golubovskii, Y. B., Smirnov, A. S., Seimer, G., Basner, R., & Kersten, H. (2009).
Electron stochastic heating in a capacitively coupled low-pressure argon rf-discharge. Plasma Sources Science and Technology,
18(2), 025026_1-6.
https://doi.org/DOI: 10.1088/0963-0252/18/2/025026Vancouver
Author
BibTeX
@article{f2333e3d2b114915a76e0a74bc658525,
title = "Electron stochastic heating in a capacitively coupled low-pressure argon rf-discharge.",
author = "M. Tatanova and Yu.B. Golubovskii and A.S. Smirnov and G. Seimer and R. Basner and H. Kersten",
year = "2009",
doi = "DOI: 10.1088/0963-0252/18/2/025026",
language = "не определен",
volume = "18",
pages = "025026_1--6",
journal = "Plasma Sources Science and Technology",
issn = "0963-0252",
publisher = "IOP Publishing Ltd.",
number = "2",
}
RIS
TY - JOUR
T1 - Electron stochastic heating in a capacitively coupled low-pressure argon rf-discharge.
AU - Tatanova, M.
AU - Golubovskii, Yu.B.
AU - Smirnov, A.S.
AU - Seimer, G.
AU - Basner, R.
AU - Kersten, H.
PY - 2009
Y1 - 2009
U2 - DOI: 10.1088/0963-0252/18/2/025026
DO - DOI: 10.1088/0963-0252/18/2/025026
M3 - статья
VL - 18
SP - 025026_1-6
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
SN - 0963-0252
IS - 2
ER -
