Standard

Electrical characterization and defect-related luminescence in oxygen implanted silicon. / Danilov, D. V.; Vyvenko, O. F.; Sobolev, N. A.; Vdovin, V. I.; Loshachenko, A. S.; Shek, E. I.; Aruev, P. N.; Zabrodskiy, V. V.

в: Solid State Phenomena, Том 242, 01.01.2016, стр. 368-373.

Результаты исследований: Научные публикации в периодических изданияхстатьяРецензирование

Harvard

Danilov, DV, Vyvenko, OF, Sobolev, NA, Vdovin, VI, Loshachenko, AS, Shek, EI, Aruev, PN & Zabrodskiy, VV 2016, 'Electrical characterization and defect-related luminescence in oxygen implanted silicon', Solid State Phenomena, Том. 242, стр. 368-373. https://doi.org/10.4028/www.scientific.net/SSP.242.368

APA

Danilov, D. V., Vyvenko, O. F., Sobolev, N. A., Vdovin, V. I., Loshachenko, A. S., Shek, E. I., Aruev, P. N., & Zabrodskiy, V. V. (2016). Electrical characterization and defect-related luminescence in oxygen implanted silicon. Solid State Phenomena, 242, 368-373. https://doi.org/10.4028/www.scientific.net/SSP.242.368

Vancouver

Danilov DV, Vyvenko OF, Sobolev NA, Vdovin VI, Loshachenko AS, Shek EI и пр. Electrical characterization and defect-related luminescence in oxygen implanted silicon. Solid State Phenomena. 2016 Янв. 1;242:368-373. https://doi.org/10.4028/www.scientific.net/SSP.242.368

Author

Danilov, D. V. ; Vyvenko, O. F. ; Sobolev, N. A. ; Vdovin, V. I. ; Loshachenko, A. S. ; Shek, E. I. ; Aruev, P. N. ; Zabrodskiy, V. V. / Electrical characterization and defect-related luminescence in oxygen implanted silicon. в: Solid State Phenomena. 2016 ; Том 242. стр. 368-373.

BibTeX

@article{ee9fe4d426804a0ba84ef1397d2aadc2,
title = "Electrical characterization and defect-related luminescence in oxygen implanted silicon",
abstract = "Defect structure, electrical properties and defect-related luminescence (DRL) of light emitting diodes (LED) with the active defect-rich region produced by oxygen implantation and a subsequent multistep annealing of silicon wafers were investigated. It was found that defect-rich regions possess an embedded positive charge in both n- and p-type of the samples whose origin was ascribed to oxygen precipitates (OP). The presence of that charge in the implanted region of p-based LED gave rise to the apparent conductivity type conversion and to a significant increase of free electron concentration in n-based LEDs. A significant difference in the shape and in the excitation dependence of luminescence spectra as well as in the properties of DLTS signals was found between p- and n-type samples. From an analysis of the obtained data the DRL band centered at 0.79 eV was ascribed to small OPs segregated at dislocations whose filling with the holes hinders optical transitions via dislocation-related states at 0.805 eV and the broad DRL band at energies higher than 0.81 eV was ascribed to large OPs.",
keywords = "Defect-related luminescence, DLTS, Oxygen ion implantation, Silicon",
author = "Danilov, {D. V.} and Vyvenko, {O. F.} and Sobolev, {N. A.} and Vdovin, {V. I.} and Loshachenko, {A. S.} and Shek, {E. I.} and Aruev, {P. N.} and Zabrodskiy, {V. V.}",
year = "2016",
month = jan,
day = "1",
doi = "10.4028/www.scientific.net/SSP.242.368",
language = "English",
volume = "242",
pages = "368--373",
journal = "Solid State Phenomena",
issn = "1012-0394",
publisher = "Scientific.net",
note = "16th International Conference on Gettering and Defect Engineering in Semiconductor Technology, GADEST 2015 ; Conference date: 20-09-2015 Through 25-09-2015",

}

RIS

TY - JOUR

T1 - Electrical characterization and defect-related luminescence in oxygen implanted silicon

AU - Danilov, D. V.

AU - Vyvenko, O. F.

AU - Sobolev, N. A.

AU - Vdovin, V. I.

AU - Loshachenko, A. S.

AU - Shek, E. I.

AU - Aruev, P. N.

AU - Zabrodskiy, V. V.

PY - 2016/1/1

Y1 - 2016/1/1

N2 - Defect structure, electrical properties and defect-related luminescence (DRL) of light emitting diodes (LED) with the active defect-rich region produced by oxygen implantation and a subsequent multistep annealing of silicon wafers were investigated. It was found that defect-rich regions possess an embedded positive charge in both n- and p-type of the samples whose origin was ascribed to oxygen precipitates (OP). The presence of that charge in the implanted region of p-based LED gave rise to the apparent conductivity type conversion and to a significant increase of free electron concentration in n-based LEDs. A significant difference in the shape and in the excitation dependence of luminescence spectra as well as in the properties of DLTS signals was found between p- and n-type samples. From an analysis of the obtained data the DRL band centered at 0.79 eV was ascribed to small OPs segregated at dislocations whose filling with the holes hinders optical transitions via dislocation-related states at 0.805 eV and the broad DRL band at energies higher than 0.81 eV was ascribed to large OPs.

AB - Defect structure, electrical properties and defect-related luminescence (DRL) of light emitting diodes (LED) with the active defect-rich region produced by oxygen implantation and a subsequent multistep annealing of silicon wafers were investigated. It was found that defect-rich regions possess an embedded positive charge in both n- and p-type of the samples whose origin was ascribed to oxygen precipitates (OP). The presence of that charge in the implanted region of p-based LED gave rise to the apparent conductivity type conversion and to a significant increase of free electron concentration in n-based LEDs. A significant difference in the shape and in the excitation dependence of luminescence spectra as well as in the properties of DLTS signals was found between p- and n-type samples. From an analysis of the obtained data the DRL band centered at 0.79 eV was ascribed to small OPs segregated at dislocations whose filling with the holes hinders optical transitions via dislocation-related states at 0.805 eV and the broad DRL band at energies higher than 0.81 eV was ascribed to large OPs.

KW - Defect-related luminescence

KW - DLTS

KW - Oxygen ion implantation

KW - Silicon

UR - http://www.scopus.com/inward/record.url?scp=84953896431&partnerID=8YFLogxK

U2 - 10.4028/www.scientific.net/SSP.242.368

DO - 10.4028/www.scientific.net/SSP.242.368

M3 - Article

VL - 242

SP - 368

EP - 373

JO - Solid State Phenomena

JF - Solid State Phenomena

SN - 1012-0394

T2 - 16th International Conference on Gettering and Defect Engineering in Semiconductor Technology, GADEST 2015

Y2 - 20 September 2015 through 25 September 2015

ER -

ID: 5788725