Результаты исследований: Публикации в книгах, отчётах, сборниках, трудах конференций › статья в сборнике материалов конференции › Рецензирование
CVD of A(III)B(v) : Gas phase cluster formation. thermodynamics of association processes. / Timoshkin, AY.
HIGH TEMPERATURE MATERIALS CHEMISTRY: PROCEEDINGS, PTS I AND II. ред. / K Hilpert; FW Froben; L Singheiser. 2000. стр. 653-656 (SCHRIFTEN DES FORSCHUNGSZENTRUMS JULICH REIHE ENERGIETECHNIK; Том 15).Результаты исследований: Публикации в книгах, отчётах, сборниках, трудах конференций › статья в сборнике материалов конференции › Рецензирование
}
TY - GEN
T1 - CVD of A(III)B(v)
AU - Timoshkin, AY
PY - 2000
Y1 - 2000
N2 - Density functional theory in form of B3LYP functional has been employed to predict structural, spectral, and thermodynamic characteristics of single-source precursors R3MYH3 and resulting intermediates in the processes of Chemical Vapor Deposition of A(m)B(v). Donor-acceptor bond strength in the source precursor may be used as a criterion to distinguish between two principal CVD mechanisms. Radical reactions dominate in case of precursors with weak donor-acceptor bond (less than or equal to 50 kJ mol(-1)), while for strongly bonded species (greater than or equal to 80 kJ mol(.1)) association processes are essential under low temperature-high pressure conditions (including laser-assisted CVD). Preserving of the metal-nitrogen bond in the gas phase during CVD process (800-1000K) opens the perspective of design of the novel single-source precursors (ring and cluster compounds) for the stoichiometry controlled CVD of nitrides, doped by the rare-earth elements. A mechanism of the carbon contamination of the nitrides with high temperature formation of M, N, C-containing ring intermediates is also suggested and discussed.
AB - Density functional theory in form of B3LYP functional has been employed to predict structural, spectral, and thermodynamic characteristics of single-source precursors R3MYH3 and resulting intermediates in the processes of Chemical Vapor Deposition of A(m)B(v). Donor-acceptor bond strength in the source precursor may be used as a criterion to distinguish between two principal CVD mechanisms. Radical reactions dominate in case of precursors with weak donor-acceptor bond (less than or equal to 50 kJ mol(-1)), while for strongly bonded species (greater than or equal to 80 kJ mol(.1)) association processes are essential under low temperature-high pressure conditions (including laser-assisted CVD). Preserving of the metal-nitrogen bond in the gas phase during CVD process (800-1000K) opens the perspective of design of the novel single-source precursors (ring and cluster compounds) for the stoichiometry controlled CVD of nitrides, doped by the rare-earth elements. A mechanism of the carbon contamination of the nitrides with high temperature formation of M, N, C-containing ring intermediates is also suggested and discussed.
KW - CHEMICAL-VAPOR-DEPOSITION
KW - ALUMINUM NITRIDE
KW - TRIMETHYLGALLIUM
KW - AMMONIA
M3 - статья в сборнике материалов конференции
SN - 3-89336-277-0
T3 - SCHRIFTEN DES FORSCHUNGSZENTRUMS JULICH REIHE ENERGIETECHNIK
SP - 653
EP - 656
BT - HIGH TEMPERATURE MATERIALS CHEMISTRY
A2 - Hilpert, K
A2 - Froben, FW
A2 - Singheiser, L
Y2 - 10 April 2000 through 14 April 2000
ER -
ID: 85942095