Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Comparative research fluorine and colloidal aggregate formation on the surface lithium fluoride thin films during electronic, ionic and thermal treatments. / Sharopov, U.; Abdusalomov, A.; Kakhramonov, A.; Rashidov, K.; Akbarova, F.; Turapova, S.; Kurbanov, M.; Saidov, D.; Egamberdiev, B.; Комолов, Алексей Сергеевич; Пшеничнюк, С.А.; Kaur, K; Bandarenka, H.
в: Vacuum, Том 213, 112133, 01.07.2023.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Comparative research fluorine and colloidal aggregate formation on the surface lithium fluoride thin films during electronic, ionic and thermal treatments
AU - Sharopov, U.
AU - Abdusalomov, A.
AU - Kakhramonov, A.
AU - Rashidov, K.
AU - Akbarova, F.
AU - Turapova, S.
AU - Kurbanov, M.
AU - Saidov, D.
AU - Egamberdiev, B.
AU - Комолов, Алексей Сергеевич
AU - Пшеничнюк, С.А.
AU - Kaur, K
AU - Bandarenka, H.
PY - 2023/7/1
Y1 - 2023/7/1
N2 - In this study, we present the results of our investigation of fluorine and colloidal aggregate formation in the LiF/Si(111) system as a function of substrate temperature and electron and ion beams. Excitons generated by electron or ion irradiation will form a stable F-H pair, which subsequently forms aggregate centres before their coalescence into fluoride and colloidal macromolecules. Additionally, after annealing the LiF film, colloids and anionic complexes are formed on the surface. The experimental data show the formation of colloids after 5 min of annealing at a temperature of 75 °C. Furthermore, when the LiF films annealed at a temperature of 400 °C, chemical reactions on the surface, such as the formation of silicide, are excited. The obtained experimental data show that an increase in the target temperature during the formation of primary point defects and their association can be represented by the migration of their components on the surface.
AB - In this study, we present the results of our investigation of fluorine and colloidal aggregate formation in the LiF/Si(111) system as a function of substrate temperature and electron and ion beams. Excitons generated by electron or ion irradiation will form a stable F-H pair, which subsequently forms aggregate centres before their coalescence into fluoride and colloidal macromolecules. Additionally, after annealing the LiF film, colloids and anionic complexes are formed on the surface. The experimental data show the formation of colloids after 5 min of annealing at a temperature of 75 °C. Furthermore, when the LiF films annealed at a temperature of 400 °C, chemical reactions on the surface, such as the formation of silicide, are excited. The obtained experimental data show that an increase in the target temperature during the formation of primary point defects and their association can be represented by the migration of their components on the surface.
KW - Colloids
KW - Electron and ion irradiation
KW - Fluorine aggregates
KW - Lithium fluoride
KW - Surface
KW - Temperature annealing
KW - Thin films
UR - https://www.mendeley.com/catalogue/00aa1f6f-5e7e-3b98-9c01-6d3864e06c00/
U2 - 10.1016/j.vacuum.2023.112133
DO - 10.1016/j.vacuum.2023.112133
M3 - Article
VL - 213
JO - Vacuum
JF - Vacuum
SN - 0042-207X
M1 - 112133
ER -
ID: 104838104