TY - JOUR

T1 - Chemical interactions at interfaces in nanoscale Mo/B4C multilayered structures

AU - Сахоненков, Сергей Сергеевич

AU - Филатова, Елена Олеговна

AU - Бугаев, Александр Викторович

AU - Полковников, Владимир Николаевич

AU - Шапошников, Роман Анатольевич

N1 - В 2024 г. IF=5.7

PY - 2024/12/1

Y1 - 2024/12/1

N2 - The study of chemical interactions between Mo and B4C layers in multilayer structures depending on their total thickness (d) and thickness ratio (Γ) was carried out using X-ray photoelectron spectroscopy (XPS) method. The results showed significant interactions of materials within the multilayer structures. Specifically, in the range of d from 1.8 to 3.4 nm and Γ value between 0.24 and 0.46, a complete conversion of B4C into MoBxCy was observed, while retaining some amount of molybdenum. The insertion of tungsten barrier layer to the Mo-on-B4C interface led only to insignificant reduction of component MoBxCy. Based on the data obtained by XPS, theoretical models were developed and applied to X-ray reflectometry data during fitting procedure. The application of XPS has proven to be highly effective in constructing models and obtaining numerical values when fitting reflection curves.

AB - The study of chemical interactions between Mo and B4C layers in multilayer structures depending on their total thickness (d) and thickness ratio (Γ) was carried out using X-ray photoelectron spectroscopy (XPS) method. The results showed significant interactions of materials within the multilayer structures. Specifically, in the range of d from 1.8 to 3.4 nm and Γ value between 0.24 and 0.46, a complete conversion of B4C into MoBxCy was observed, while retaining some amount of molybdenum. The insertion of tungsten barrier layer to the Mo-on-B4C interface led only to insignificant reduction of component MoBxCy. Based on the data obtained by XPS, theoretical models were developed and applied to X-ray reflectometry data during fitting procedure. The application of XPS has proven to be highly effective in constructing models and obtaining numerical values when fitting reflection curves.

KW - Chemical interaction, XPS

KW - Mo/B4C

KW - X-ray multilayer mirrors

UR - https://www.mendeley.com/catalogue/4cc8ce81-6e66-3a9e-a603-138eed64136d/

U2 - 10.1016/j.surfin.2024.105467

DO - 10.1016/j.surfin.2024.105467

M3 - Article

VL - 55

JO - Surfaces and Interfaces

JF - Surfaces and Interfaces

SN - 2468-0230

M1 - 105467

ER -