Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Application of NiO deposited by atomic layer deposition for carbon nanotubes catalytic growth. / Filatov, L.; Vishniakov, P.; Ezhov, I.; Gorbov, I.; Nazarov, D.; Olkhovskii, D.; Kumar, R.; Peng, S.; He, Gang; Chernyavsky, V.; Gushchina, M.; Maximov, M.
в: Materials Letters, Том 353, 135250, 15.12.2023.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
}
TY - JOUR
T1 - Application of NiO deposited by atomic layer deposition for carbon nanotubes catalytic growth
AU - Filatov, L.
AU - Vishniakov, P.
AU - Ezhov, I.
AU - Gorbov, I.
AU - Nazarov, D.
AU - Olkhovskii, D.
AU - Kumar, R.
AU - Peng, S.
AU - He, Gang
AU - Chernyavsky, V.
AU - Gushchina, M.
AU - Maximov, M.
N1 - Export Date: 21 August 2024; Cited By: 3; Correspondence Address: M. Maximov; Peter the Great Saint-Petersburg Polytechnic University, Saint Petersburg, 195251, Russian Federation; email: maximspbstu@mail.ru; CODEN: MLETD
PY - 2023/12/15
Y1 - 2023/12/15
N2 - Carbon nanotubes (CNTs) are a unique object for various kinds of electronic devices. At the same time, an important task remains the development of catalytic structure synthesis methods for repeatability and uniform growth of CNTs. One of such methods is atomic layer deposition (ALD). The article considers the effect of the initial NiO layer thickness obtained by the ALD method on the growth of carbon nanotubes array. Deposition of the CNTs was carried out by the direct current plasma-enhanced chemical vapor deposition method using a direct current discharge in an acetylene and ammonia at 680 °C. Before CNT deposition, the NiO film was reduced to metallic nickel in an ammonia atmosphere at 680 °C. Samples were studied by scanning and transmission electron microscopy. As a result, the thickness of the initial NiO film for intensive CNT growth was in the range of 3.5 to 3.9 nm. CNTs had a “multi-walled” structure and consisted of 15 ± 5 graphene layers. The density of the tubes was about 7.5 ± 0.2 × 1010 cm−2, and the length was 6–7.5 µm. © 2023 Elsevier B.V.
AB - Carbon nanotubes (CNTs) are a unique object for various kinds of electronic devices. At the same time, an important task remains the development of catalytic structure synthesis methods for repeatability and uniform growth of CNTs. One of such methods is atomic layer deposition (ALD). The article considers the effect of the initial NiO layer thickness obtained by the ALD method on the growth of carbon nanotubes array. Deposition of the CNTs was carried out by the direct current plasma-enhanced chemical vapor deposition method using a direct current discharge in an acetylene and ammonia at 680 °C. Before CNT deposition, the NiO film was reduced to metallic nickel in an ammonia atmosphere at 680 °C. Samples were studied by scanning and transmission electron microscopy. As a result, the thickness of the initial NiO film for intensive CNT growth was in the range of 3.5 to 3.9 nm. CNTs had a “multi-walled” structure and consisted of 15 ± 5 graphene layers. The density of the tubes was about 7.5 ± 0.2 × 1010 cm−2, and the length was 6–7.5 µm. © 2023 Elsevier B.V.
KW - ALD
KW - Atomic layer deposition
KW - Carbon nanotubes
KW - Catalyst
KW - CNTs
KW - Ammonia
KW - Atoms
KW - Electric discharges
KW - Graphene
KW - High resolution transmission electron microscopy
KW - Nanocatalysts
KW - Nanotubes
KW - Nickel oxide
KW - Plasma CVD
KW - Plasma enhanced chemical vapor deposition
KW - Scanning electron microscopy
KW - Atomic-layer deposition
KW - Catalytic growth
KW - Catalytic structure
KW - Electronics devices
KW - Layer thickness
KW - NiO films
KW - Structure synthesis
KW - Synthesis method
KW - ]+ catalyst
U2 - 10.1016/j.matlet.2023.135250
DO - 10.1016/j.matlet.2023.135250
M3 - статья
VL - 353
JO - Materials Letters
JF - Materials Letters
SN - 0167-577X
M1 - 135250
ER -
ID: 122955524