Technetium carbonyl complexes [TcBr(CO)₅], [TcI(CO)₅], [TcX(CO)₃]₄ (X = Cl, Br, I), [TcBr(CO)₃en] (en = ethylenediamine), [Tc(RCOCHCOR′)(CO)₃(Et₂NH)] [R = CH₃ or C(CH₃)₃, R′ = CF₃], Tc₂(CO)₁₀, and [Tc(C₅H₅)(CO)₃] were tested as starting compounds for chemical vapor deposition of technetium coatings. The conditions of deposition of technetium coatings were determined, and the deposition yields were evaluated.