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Use of Equivalent Reactant Feeding in Deposition of Ni–Mn–O Coatings by Molecular Layering. / Ezhov, I. S.; Nazarov, D. V.; Vishnyakov, P. S.; Koshtyal, Yu M.; Rumyantsev, A. M.; Kumar, Rajesh; Popovich, A. A.; Maksimov, M. Yu.

In: Russian Journal of Applied Chemistry, Vol. 95, No. 3, 03.2022, p. 352-356.

Research output: Contribution to journal › Article › peer-review

Harvard

Ezhov, IS, Nazarov, DV, Vishnyakov, PS, Koshtyal, YM, Rumyantsev, AM, Kumar, R, Popovich, AA & Maksimov, MY 2022, 'Use of Equivalent Reactant Feeding in Deposition of Ni–Mn–O Coatings by Molecular Layering', Russian Journal of Applied Chemistry, vol. 95, no. 3, pp. 352-356. https://doi.org/10.1134/s107042722203003x

APA

Ezhov, I. S., Nazarov, D. V., Vishnyakov, P. S., Koshtyal, Y. M., Rumyantsev, A. M., Kumar, R., Popovich, A. A., & Maksimov, M. Y. (2022). Use of Equivalent Reactant Feeding in Deposition of Ni–Mn–O Coatings by Molecular Layering. Russian Journal of Applied Chemistry, 95(3), 352-356. https://doi.org/10.1134/s107042722203003x

Vancouver

Ezhov IS, Nazarov DV, Vishnyakov PS, Koshtyal YM, Rumyantsev AM, Kumar R et al. Use of Equivalent Reactant Feeding in Deposition of Ni–Mn–O Coatings by Molecular Layering. Russian Journal of Applied Chemistry. 2022 Mar;95(3):352-356. https://doi.org/10.1134/s107042722203003x

Author

Ezhov, I. S. ; Nazarov, D. V. ; Vishnyakov, P. S. ; Koshtyal, Yu M. ; Rumyantsev, A. M. ; Kumar, Rajesh ; Popovich, A. A. ; Maksimov, M. Yu. / Use of Equivalent Reactant Feeding in Deposition of Ni–Mn–O Coatings by Molecular Layering. In: Russian Journal of Applied Chemistry. 2022 ; Vol. 95, No. 3. pp. 352-356.

BibTeX

@article{0c24cc0019664166a714c58d8033c71d,
title = "Use of Equivalent Reactant Feeding in Deposition of Ni–Mn–O Coatings by Molecular Layering",
abstract = "Abstract: The deposition of Ni–Mn–O thin films by molecular layering with equivalent feeding of organometallic reactants was studied. Bis(cyclopentadienyl)nickel (NiCp2) and tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III) [Mn(thd)3] were used as organometallic reactants. Oxygen-containing plasma was used for forming oxygen-containing structures. The mean increment of the Ni–Mn–O coating thickness in one cycle exceeds the sum of the corresponding values known for NiO and Mn2O3. At equivalent feeding, the nickel content of the coating exceeds the manganese content. High Coulomb efficiency (100%) of samples with the Ni–Mn–O coating on a steel support as an electrode is due to high reversibility of the electrochemical processes occurring in the course of charging–discharging trials. With an 80-fold increase in the discharging current, the discharging capacity decreases by less than 30%.",
keywords = "anodes, molecular layering, oxygen plasma, thin-film electrodes, transition metal oxides",
author = "Ezhov, {I. S.} and Nazarov, {D. V.} and Vishnyakov, {P. S.} and Koshtyal, {Yu M.} and Rumyantsev, {A. M.} and Rajesh Kumar and Popovich, {A. A.} and Maksimov, {M. Yu}",
note = "Publisher Copyright: {\textcopyright} 2022, Pleiades Publishing, Ltd.",
year = "2022",
month = mar,
doi = "10.1134/s107042722203003x",
language = "English",
volume = "95",
pages = "352--356",
journal = "Russian Journal of Applied Chemistry",
issn = "1070-4272",
publisher = "МАИК {"}Наука/Интерпериодика{"}",
number = "3",

}

RIS

TY - JOUR

T1 - Use of Equivalent Reactant Feeding in Deposition of Ni–Mn–O Coatings by Molecular Layering

AU - Ezhov, I. S.

AU - Nazarov, D. V.

AU - Vishnyakov, P. S.

AU - Koshtyal, Yu M.

AU - Rumyantsev, A. M.

AU - Kumar, Rajesh

AU - Popovich, A. A.

AU - Maksimov, M. Yu

N1 - Publisher Copyright: © 2022, Pleiades Publishing, Ltd.

PY - 2022/3

Y1 - 2022/3

N2 - Abstract: The deposition of Ni–Mn–O thin films by molecular layering with equivalent feeding of organometallic reactants was studied. Bis(cyclopentadienyl)nickel (NiCp2) and tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III) [Mn(thd)3] were used as organometallic reactants. Oxygen-containing plasma was used for forming oxygen-containing structures. The mean increment of the Ni–Mn–O coating thickness in one cycle exceeds the sum of the corresponding values known for NiO and Mn2O3. At equivalent feeding, the nickel content of the coating exceeds the manganese content. High Coulomb efficiency (100%) of samples with the Ni–Mn–O coating on a steel support as an electrode is due to high reversibility of the electrochemical processes occurring in the course of charging–discharging trials. With an 80-fold increase in the discharging current, the discharging capacity decreases by less than 30%.

AB - Abstract: The deposition of Ni–Mn–O thin films by molecular layering with equivalent feeding of organometallic reactants was studied. Bis(cyclopentadienyl)nickel (NiCp2) and tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III) [Mn(thd)3] were used as organometallic reactants. Oxygen-containing plasma was used for forming oxygen-containing structures. The mean increment of the Ni–Mn–O coating thickness in one cycle exceeds the sum of the corresponding values known for NiO and Mn2O3. At equivalent feeding, the nickel content of the coating exceeds the manganese content. High Coulomb efficiency (100%) of samples with the Ni–Mn–O coating on a steel support as an electrode is due to high reversibility of the electrochemical processes occurring in the course of charging–discharging trials. With an 80-fold increase in the discharging current, the discharging capacity decreases by less than 30%.

KW - anodes

KW - molecular layering

KW - oxygen plasma

KW - thin-film electrodes

KW - transition metal oxides

UR - http://www.scopus.com/inward/record.url?scp=85137667757&partnerID=8YFLogxK

UR - https://www.mendeley.com/catalogue/bce93bdb-7bf9-3b3c-9596-597d29134b91/

U2 - 10.1134/s107042722203003x

DO - 10.1134/s107042722203003x

M3 - Article

AN - SCOPUS:85137667757

VL - 95

SP - 352

EP - 356

JO - Russian Journal of Applied Chemistry

JF - Russian Journal of Applied Chemistry

SN - 1070-4272

IS - 3

ER -

ID: 99567799