We studied the synthesis reaction of Mg 2NiH 4 hydride films when a nickel plate and magnesium hydride powder interacted in the presence of hydrogen at 450 °C. The hydrogen pressure (>6 MPa) was higher than the synthesis equilibrium pressure for both Mg 2NiH 4 and MgH 2 hydrides. Film examination with scanning electron microscopy, energy-dispersive X-ray spectroscopy, X-ray diffraction, and thermal desorption spectroscopy methods revealed that a dense polycrystalline film of Mg 2NiH 4 hydride grows on a thin (0.9 μm) underlayer of intermetallic alloy MgNi 2. The synthesis time variation made it possible to create Mg 2NiH 4 films with a width of 0.2 to 4 μm. Based on analysis of the growth kinetics, the crystal structure of the material, and energies of chemical bonds between atoms, we show that the interface between MgNi 2 and Mg 2NiH 4 is the most probable location of the growth reaction. We have obtained cathode luminescence spectra of the Mg 2NiH 4 hydride film. Mg 2NiH 4 is found to be an indirect gap semiconductor with a gap value of ∼1.6 eV. However, luminescence with quanta energy higher than the band gap is registered. We associate this fact with Van Hove singularities in the Mg 2NiH 4 density of states.

Original languageEnglish
Article number139556
JournalThin Solid Films
Volume762
DOIs
StatePublished - 30 Nov 2022

    Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

ID: 100018893